Formation of SrTiO3 nanocrystals in amorphous Lu2O3 high-k gate dielectric for floating gate memory application

We have developed a method based upon pulsed laser deposition to produce SrTiO3 nanocrystals embedded in amorphous Lu2O3 high-k dielectric. The high resolution transmission electron microscopy study revealed the complete isolation of SrTiO3 nanocrystals embedded in Lu2O...

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Main Authors:	Yuan, C. L., Darmawan, P., Setiawan, Y., Lee, Pooi See, Ma, Jan
Other Authors:	School of Materials Science & Engineering
Format:	Article
Language:	English
Published:	2012
Subjects:	DRNTU::Engineering::Materials
Online Access:	https://hdl.handle.net/10356/94591 http://hdl.handle.net/10220/8013
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Institution:	Nanyang Technological University
Language:	English

id	sg-ntu-dr.10356-94591
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spelling	sg-ntu-dr.10356-945912023-07-14T15:50:04Z Formation of SrTiO3 nanocrystals in amorphous Lu2O3 high-k gate dielectric for floating gate memory application Yuan, C. L. Darmawan, P. Setiawan, Y. Lee, Pooi See Ma, Jan School of Materials Science & Engineering DRNTU::Engineering::Materials We have developed a method based upon pulsed laser deposition to produce SrTiO3 nanocrystals embedded in amorphous Lu2O3 high-k dielectric. The high resolution transmission electron microscopy study revealed the complete isolation of SrTiO3 nanocrystals embedded in Lu2O3 matrix with 4 nm diameter and well distributed with an area density estimated to be about 8x 10^11 cm−2. A pronounced capacitance-voltage hysteresis is observed with a memory window of ~1.5 V under the 6 V programming. In addition, the retention characteristics are tested to be robust. Published version 2012-05-16T07:08:32Z 2019-12-06T18:58:49Z 2012-05-16T07:08:32Z 2019-12-06T18:58:49Z 2006 2006 Journal Article Yuan, C. L., Darmawan, P., Setiawan, Y., Lee, P. S., & Ma, J. (2006). Formation of SrTiO3 nanocrystals in amorphous Lu2O3 high-k gate dielectric for floating gate memory application. Applied Physics Letters, 89(4). https://hdl.handle.net/10356/94591 http://hdl.handle.net/10220/8013 10.1063/1.2234302 en Applied physics letters © 2006 American Institute of Physics. This paper was published in Applied Physics Letters and is made available as an electronic reprint (preprint) with permission of American Institute of Physics. The paper can be found at the following official URL: http://dx.doi.org/10.1063/1.2234302. One print or electronic copy may be made for personal use only. Systematic or multiple reproduction, distribution to multiple locations via electronic or other means, duplication of any material in this paper for a fee or for commercial purposes, or modification of the content of the paper is prohibited and is subject to penalties under law. 3 p. application/pdf
institution	Nanyang Technological University
building	NTU Library
continent	Asia
country	Singapore Singapore
content_provider	NTU Library
collection	DR-NTU
language	English
topic	DRNTU::Engineering::Materials
spellingShingle	DRNTU::Engineering::Materials Yuan, C. L. Darmawan, P. Setiawan, Y. Lee, Pooi See Ma, Jan Formation of SrTiO3 nanocrystals in amorphous Lu2O3 high-k gate dielectric for floating gate memory application
description	We have developed a method based upon pulsed laser deposition to produce SrTiO3 nanocrystals embedded in amorphous Lu2O3 high-k dielectric. The high resolution transmission electron microscopy study revealed the complete isolation of SrTiO3 nanocrystals embedded in Lu2O3 matrix with 4 nm diameter and well distributed with an area density estimated to be about 8x 10^11 cm−2. A pronounced capacitance-voltage hysteresis is observed with a memory window of ~1.5 V under the 6 V programming. In addition, the retention characteristics are tested to be robust.
author2	School of Materials Science & Engineering
author_facet	School of Materials Science & Engineering Yuan, C. L. Darmawan, P. Setiawan, Y. Lee, Pooi See Ma, Jan
format	Article
author	Yuan, C. L. Darmawan, P. Setiawan, Y. Lee, Pooi See Ma, Jan
author_sort	Yuan, C. L.
title	Formation of SrTiO3 nanocrystals in amorphous Lu2O3 high-k gate dielectric for floating gate memory application
title_short	Formation of SrTiO3 nanocrystals in amorphous Lu2O3 high-k gate dielectric for floating gate memory application
title_full	Formation of SrTiO3 nanocrystals in amorphous Lu2O3 high-k gate dielectric for floating gate memory application
title_fullStr	Formation of SrTiO3 nanocrystals in amorphous Lu2O3 high-k gate dielectric for floating gate memory application
title_full_unstemmed	Formation of SrTiO3 nanocrystals in amorphous Lu2O3 high-k gate dielectric for floating gate memory application
title_sort	formation of srtio3 nanocrystals in amorphous lu2o3 high-k gate dielectric for floating gate memory application
publishDate	2012
url	https://hdl.handle.net/10356/94591 http://hdl.handle.net/10220/8013
_version_	1772825412520378368

Formation of SrTiO3 nanocrystals in amorphous Lu2O3 high-k gate dielectric for floating gate memory application

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