Thermal stability of rare-earth based ultrathin Lu2O3 for high-k dielectrics
Lu2O3 thin film was deposited on n-type (100) Si substrates using pulsed laser deposition. A k value of 15.95 with an equivalent oxide thickness (EOT) of 1.10 nm and a current density of 2.6×10−5 A/cm2 at +1 V accumulation bias is achievable for the 4.5 nm thick Lu2O3 thin film deposited at room tem...
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sg-ntu-dr.10356-949132023-07-14T15:53:28Z Thermal stability of rare-earth based ultrathin Lu2O3 for high-k dielectrics Darmawan, P. Setiawan, Y. Lai, J. C. Yang, P. Lee, Pooi See School of Materials Science & Engineering DRNTU::Engineering::Materials Lu2O3 thin film was deposited on n-type (100) Si substrates using pulsed laser deposition. A k value of 15.95 with an equivalent oxide thickness (EOT) of 1.10 nm and a current density of 2.6×10−5 A/cm2 at +1 V accumulation bias is achievable for the 4.5 nm thick Lu2O3 thin film deposited at room temperature after postdeposition annealing at 600 °C in oxygen ambient. Annealing a similar sample at 900 °C caused the EOT and leakage current density to increase to 1.68 nm and 1×10−4 A/cm2, respectively. High resolution transmission electron microscopy analysis has shown that Lu2O3 film remains amorphous at high temperature annealing at 900 °C. An x-ray reflectivity analysis on a separately prepared sample with lower annealing temperature (800 °C) suggested a formation of Lu-based silicate layer. It is believed that the formation of low-k silicate layer may have contributed to the observed increase in EOT and the reduction in the k value. Published version 2012-09-18T02:44:20Z 2019-12-06T19:04:34Z 2012-09-18T02:44:20Z 2019-12-06T19:04:34Z 2007 2007 Journal Article Darmawan, P., Lee, P. S., Setiawan, Y., Lai, J. C., & Yang, P. (2007). Thermal stability of rare-earth based ultrathin Lu2O3 for high-k dielectrics. Journal of Vacuum Science & Technology B, 25(4), 1203. 10711023 https://hdl.handle.net/10356/94913 http://hdl.handle.net/10220/8556 10.1116/1.2749526 en Journal of vacuum science & technology B © 2007 American Vacuum Society. This paper was published in Journal of Vacuum Science & Technology B and is made available as an electronic reprint (preprint) with permission of American Vacuum Society. The paper can be found at DOI: [http://dx.doi.org/10.1116/1.2749526]. One print or electronic copy may be made for personal use only. Systematic or multiple reproduction, distribution to multiple locations via electronic or other means, duplication of any material in this paper for a fee or for commercial purposes, or modification of the content of the paper is prohibited and is subject to penalties under law. application/pdf |
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DRNTU::Engineering::Materials Darmawan, P. Setiawan, Y. Lai, J. C. Yang, P. Lee, Pooi See Thermal stability of rare-earth based ultrathin Lu2O3 for high-k dielectrics |
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Lu2O3 thin film was deposited on n-type (100) Si substrates using pulsed laser deposition. A k value of 15.95 with an equivalent oxide thickness (EOT) of 1.10 nm and a current density of 2.6×10−5 A/cm2 at +1 V accumulation bias is achievable for the 4.5 nm thick Lu2O3 thin film deposited at room temperature after postdeposition annealing at 600 °C in oxygen ambient. Annealing a similar sample at 900 °C caused the EOT and leakage current density to increase to 1.68 nm and 1×10−4 A/cm2, respectively. High resolution transmission electron microscopy analysis has shown that Lu2O3 film remains amorphous at high temperature annealing at 900 °C. An x-ray reflectivity analysis on a separately prepared sample with lower annealing temperature (800 °C) suggested a formation of Lu-based silicate layer. It is believed that the formation of low-k silicate layer may have contributed to the observed increase in EOT and the reduction in the k value. |
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School of Materials Science & Engineering |
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School of Materials Science & Engineering Darmawan, P. Setiawan, Y. Lai, J. C. Yang, P. Lee, Pooi See |
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Article |
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Darmawan, P. Setiawan, Y. Lai, J. C. Yang, P. Lee, Pooi See |
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Darmawan, P. |
title |
Thermal stability of rare-earth based ultrathin Lu2O3 for high-k dielectrics |
title_short |
Thermal stability of rare-earth based ultrathin Lu2O3 for high-k dielectrics |
title_full |
Thermal stability of rare-earth based ultrathin Lu2O3 for high-k dielectrics |
title_fullStr |
Thermal stability of rare-earth based ultrathin Lu2O3 for high-k dielectrics |
title_full_unstemmed |
Thermal stability of rare-earth based ultrathin Lu2O3 for high-k dielectrics |
title_sort |
thermal stability of rare-earth based ultrathin lu2o3 for high-k dielectrics |
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2012 |
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https://hdl.handle.net/10356/94913 http://hdl.handle.net/10220/8556 |
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1772825858126381056 |