Pyramidal structural defects in erbium silicide thin films

Pyramidal structural defects, 5–8 μm wide, have been discovered in thin films of epitaxial ErSi2−x formed by annealing thin Er films on Si(001) substrates at temperatures of 500–800 °C. The formation of these defects is not due to oxidation. We propose that they form as a result of the separat...

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Bibliographic Details
Main Authors: Srolovitz, David J., Tan, Eu Jin, Bouville, Mathieu, Chi, Dong Zhi, Pey, Kin Leong, Lee, Pooi See, Tung, Chih Hang
Other Authors: School of Materials Science & Engineering
Format: Article
Language:English
Published: 2012
Subjects:
Online Access:https://hdl.handle.net/10356/95015
http://hdl.handle.net/10220/8074
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Institution: Nanyang Technological University
Language: English
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