Lanthanide-based graded barrier structure for enhanced nanocrystal memory properties
A memory structure comprising Ge nanocrystals and lanthanide-based charge trapping dielectric stack was fabricated to realize a self-aligned graded barrier structure. By exploiting efficient charge trapping of the nanocrystals embedded in the heterogeneous high-k dielectric, strong memory eff...
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sg-ntu-dr.10356-950232023-07-14T15:46:36Z Lanthanide-based graded barrier structure for enhanced nanocrystal memory properties Chan, T. K. Osipowicz, T. Chan, L. Chan, Mei Yin Lee, Pooi See School of Materials Science & Engineering DRNTU::Engineering::Materials A memory structure comprising Ge nanocrystals and lanthanide-based charge trapping dielectric stack was fabricated to realize a self-aligned graded barrier structure. By exploiting efficient charge trapping of the nanocrystals embedded in the heterogeneous high-k dielectric, strong memory effect was manifested by a large counterclockwise capacitance-voltage hysteresis of 2.7 V under a low voltage operation of ±4 V. The high-k barrier with graded composition provides a favorable confinement barrier for improved hole retention with simultaneous enlargement of the memory window. Published version 2012-05-16T04:17:36Z 2019-12-06T19:06:42Z 2012-05-16T04:17:36Z 2019-12-06T19:06:42Z 2009 2009 Journal Article Chan, M. Y., Chan, T. K., Osipowicz, T., Chan, L., & Lee, P. S. (2009). Lanthanide-based graded barrier structure for enhanced nanocrystal memory properties. Applied physics letters, 95(11). https://hdl.handle.net/10356/95023 http://hdl.handle.net/10220/8007 10.1063/1.3224188 en Applied physics letters © 2009 American Institute of Physics. This paper was published in Applied Physics Letters and is made available as an electronic reprint (preprint) with permission of American Institute of Physics. The paper can be found at the following official URL: http://dx.doi.org/10.1063/1.3224188. One print or electronic copy may be made for personal use only. Systematic or multiple reproduction, distribution to multiple locations via electronic or other means, duplication of any material in this paper for a fee or for commercial purposes, or modification of the content of the paper is prohibited and is subject to penalties under law. 3 p. application/pdf |
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DRNTU::Engineering::Materials Chan, T. K. Osipowicz, T. Chan, L. Chan, Mei Yin Lee, Pooi See Lanthanide-based graded barrier structure for enhanced nanocrystal memory properties |
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A memory structure comprising Ge nanocrystals and lanthanide-based charge trapping dielectric stack was fabricated to realize a self-aligned graded barrier structure. By exploiting efficient charge
trapping of the nanocrystals embedded in the heterogeneous high-k dielectric, strong memory effect
was manifested by a large counterclockwise capacitance-voltage hysteresis of 2.7 V under a low
voltage operation of ±4 V. The high-k barrier with graded composition provides a favorable
confinement barrier for improved hole retention with simultaneous enlargement of the memory window. |
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School of Materials Science & Engineering |
author_facet |
School of Materials Science & Engineering Chan, T. K. Osipowicz, T. Chan, L. Chan, Mei Yin Lee, Pooi See |
format |
Article |
author |
Chan, T. K. Osipowicz, T. Chan, L. Chan, Mei Yin Lee, Pooi See |
author_sort |
Chan, T. K. |
title |
Lanthanide-based graded barrier structure for enhanced nanocrystal memory properties |
title_short |
Lanthanide-based graded barrier structure for enhanced nanocrystal memory properties |
title_full |
Lanthanide-based graded barrier structure for enhanced nanocrystal memory properties |
title_fullStr |
Lanthanide-based graded barrier structure for enhanced nanocrystal memory properties |
title_full_unstemmed |
Lanthanide-based graded barrier structure for enhanced nanocrystal memory properties |
title_sort |
lanthanide-based graded barrier structure for enhanced nanocrystal memory properties |
publishDate |
2012 |
url |
https://hdl.handle.net/10356/95023 http://hdl.handle.net/10220/8007 |
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1772827937915011072 |