Deposition of Ni/TiN composite coatings by a plasma assisted MOCVD using an organometallic precursor

Titanium nitride (TiN)/nickel (Ni) composite coatings were synthesized by plasma assisted metal-organic chemical vapour deposition (PAMOCVD) using organo-metallic and metal-organic complexes namely dichlorobis( 5- cyclopentadienyl)titanium (IV) for titanium and N,N'-ethylene-bis(2,4-pentanedion...

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Main Authors: Maiyalagan, Thandavarayan, Arockiasamy, S., Kuppusami, P., Mallika, C., Nagaraja, K. S.
Other Authors: School of Chemical and Biomedical Engineering
Format: Article
Language:English
Published: 2013
Online Access:https://hdl.handle.net/10356/95842
http://hdl.handle.net/10220/11352
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Institution: Nanyang Technological University
Language: English
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spelling sg-ntu-dr.10356-958422020-03-07T11:35:35Z Deposition of Ni/TiN composite coatings by a plasma assisted MOCVD using an organometallic precursor Maiyalagan, Thandavarayan Arockiasamy, S. Kuppusami, P. Mallika, C. Nagaraja, K. S. School of Chemical and Biomedical Engineering Titanium nitride (TiN)/nickel (Ni) composite coatings were synthesized by plasma assisted metal-organic chemical vapour deposition (PAMOCVD) using organo-metallic and metal-organic complexes namely dichlorobis( 5- cyclopentadienyl)titanium (IV) for titanium and N,N'-ethylene-bis(2,4-pentanedion-iminoato)nickel(II) for nickel. The growth of such films was investigated in nitrogen (N2) plasma environment in the substrate temperature range of 450- 550ºC at a deposition pressure of 0.5-1 mbar. Prior to the deposition of films, the Ti precursor was subjected to the equilibrium vapour pressure measurements by employing TG/DTA in transpiration mode, which led to the value of 109.2 ± 5.6 kJ mol-1 for the standard enthalpy of sublimation (ΔHo sub). The phase identification using glancing incidence x-ray diffraction showed Ni/TiN is a nanocomposite coating containing nanocrystals of Ni and TiN with face centered cubic structure. Scanning electron microscopy revealed a uniform surface morphology of the films, while chemical analysis by energy dispersive analysis confirmed the presence of titanium, nickel and nitrogen in the composite films. 2013-07-15T02:08:43Z 2019-12-06T19:22:15Z 2013-07-15T02:08:43Z 2019-12-06T19:22:15Z 2012 2012 Journal Article Arockiasamy, S., Maiyalagan, T., Kuppusami, P., Mallika, C.,& Nagaraja, K. (2012). Deposition of Ni/TiN composite coatings by a plasma assisted MOCVD using an organometallic precursor. Micro and nanosystems, 4(3), 199-207. 1876-4029 https://hdl.handle.net/10356/95842 http://hdl.handle.net/10220/11352 10.2174/1876402911204030199 en Micro and nanosystems © 2012 Bentham Science Publishers.
institution Nanyang Technological University
building NTU Library
country Singapore
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language English
description Titanium nitride (TiN)/nickel (Ni) composite coatings were synthesized by plasma assisted metal-organic chemical vapour deposition (PAMOCVD) using organo-metallic and metal-organic complexes namely dichlorobis( 5- cyclopentadienyl)titanium (IV) for titanium and N,N'-ethylene-bis(2,4-pentanedion-iminoato)nickel(II) for nickel. The growth of such films was investigated in nitrogen (N2) plasma environment in the substrate temperature range of 450- 550ºC at a deposition pressure of 0.5-1 mbar. Prior to the deposition of films, the Ti precursor was subjected to the equilibrium vapour pressure measurements by employing TG/DTA in transpiration mode, which led to the value of 109.2 ± 5.6 kJ mol-1 for the standard enthalpy of sublimation (ΔHo sub). The phase identification using glancing incidence x-ray diffraction showed Ni/TiN is a nanocomposite coating containing nanocrystals of Ni and TiN with face centered cubic structure. Scanning electron microscopy revealed a uniform surface morphology of the films, while chemical analysis by energy dispersive analysis confirmed the presence of titanium, nickel and nitrogen in the composite films.
author2 School of Chemical and Biomedical Engineering
author_facet School of Chemical and Biomedical Engineering
Maiyalagan, Thandavarayan
Arockiasamy, S.
Kuppusami, P.
Mallika, C.
Nagaraja, K. S.
format Article
author Maiyalagan, Thandavarayan
Arockiasamy, S.
Kuppusami, P.
Mallika, C.
Nagaraja, K. S.
spellingShingle Maiyalagan, Thandavarayan
Arockiasamy, S.
Kuppusami, P.
Mallika, C.
Nagaraja, K. S.
Deposition of Ni/TiN composite coatings by a plasma assisted MOCVD using an organometallic precursor
author_sort Maiyalagan, Thandavarayan
title Deposition of Ni/TiN composite coatings by a plasma assisted MOCVD using an organometallic precursor
title_short Deposition of Ni/TiN composite coatings by a plasma assisted MOCVD using an organometallic precursor
title_full Deposition of Ni/TiN composite coatings by a plasma assisted MOCVD using an organometallic precursor
title_fullStr Deposition of Ni/TiN composite coatings by a plasma assisted MOCVD using an organometallic precursor
title_full_unstemmed Deposition of Ni/TiN composite coatings by a plasma assisted MOCVD using an organometallic precursor
title_sort deposition of ni/tin composite coatings by a plasma assisted mocvd using an organometallic precursor
publishDate 2013
url https://hdl.handle.net/10356/95842
http://hdl.handle.net/10220/11352
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