Fourier transform infrared spectroscopy of low-k dielectric material on patterned wafers

• Main Authors: Huang, Maggie Y. M., Lam, Jeffrey Chorkeung, Tan, Hao, Zhang, Fan, Sun, Handong, Shen, Zexiang, Mai, Zhihong
• 其他作者: School of Physical and Mathematical Sciences
• 格式: Article
• 語言: English
• 出版: 2013
• 在線閱讀: https://hdl.handle.net/10356/96810; http://hdl.handle.net/10220/11660
• 機構: Nanyang Technological University

With many of research on Fourier transform IR (FTIR) on low-k materials, our experiments extended the FTIR spectroscopy application to characterization and analysis of the low-k dielectric thin film properties on patterned wafers. FTIR spectra on low-k materials were successfully captured under thre...