Fourier transform infrared spectroscopy of low-k dielectric material on patterned wafers

• المؤلفون الرئيسيون: Huang, Maggie Y. M., Lam, Jeffrey Chorkeung, Tan, Hao, Zhang, Fan, Sun, Handong, Shen, Zexiang, Mai, Zhihong
• مؤلفون آخرون: School of Physical and Mathematical Sciences
• التنسيق: مقال
• اللغة: English
• منشور في: 2013
• الوصول للمادة أونلاين: https://hdl.handle.net/10356/96810; http://hdl.handle.net/10220/11660
• المؤسسة: Nanyang Technological University

With many of research on Fourier transform IR (FTIR) on low-k materials, our experiments extended the FTIR spectroscopy application to characterization and analysis of the low-k dielectric thin film properties on patterned wafers. FTIR spectra on low-k materials were successfully captured under thre...