Synthesis of ultra-small Si/Ge semiconductor nano-particles using electrochemistry
In this paper, we describe the formation of colloidal Si/Ge semiconductor nano-particles by electrochemical etching of Ge quantum dots (GEDOT), Silicon–Germanium graded layers (GRADE) and Silicon–Germanium multi-quantum well (MQW) structures which are prepared on Silicon wafers using low pressure ch...
Saved in:
Main Authors: | , , |
---|---|
Other Authors: | |
Format: | Article |
Language: | English |
Published: |
2013
|
Subjects: | |
Online Access: | https://hdl.handle.net/10356/97660 http://hdl.handle.net/10220/11173 |
Tags: |
Add Tag
No Tags, Be the first to tag this record!
|
Institution: | Nanyang Technological University |
Language: | English |