Amorphous/crystalline silicon heterojunction solar cells via remote inductively coupled plasma processing

Amorphous/crystalline silicon heterojunction solar cells via remote inductively coupled plasma processing

Low-frequency inductively coupled plasma (ICP) has been widely used to deposit amorphous or microcrystalline Si thin films, but the intrinsic drawback namely ion bombardment effect limits its application in Si heterojunction solar cells. In this letter, we redesigned typical ICP and realized a remot...

Full description

Saved in:
Bibliographic Details
Main Authors: Xu, L. X., Xiao, S. Q., Xu, S., Zhou, H. P., Wei, D. Y., Huang, S. Y., Sern, C. C., Guo, Y. N., Khan, S.
Other Authors: Institute of Advanced Studies
Format: Article
Language:English
Published: 2013
Subjects:
DRNTU::Science::Physics
Online Access:https://hdl.handle.net/10356/97916
http://hdl.handle.net/10220/12019
Tags: Add Tag
No Tags, Be the first to tag this record!
Institution: Nanyang Technological University
Language: English
Description
Summary:Low-frequency inductively coupled plasma (ICP) has been widely used to deposit amorphous or microcrystalline Si thin films, but the intrinsic drawback namely ion bombardment effect limits its application in Si heterojunction solar cells. In this letter, we redesigned typical ICP and realized a remote plasma deposition with suppressed ion bombardment effect. This remote ICP system enables the synthesis of high quality amorphous Si layers with a compact network and a high hydrogen content (10.5%). By using this remote ICP system, we achieved amorphous/crystalline silicon heterojunction solar cells with an efficiency of 14.1% without any back surface field or textures.

Similar Items