Structural and electrical properties of tantalum nitride thin films fabricated by using reactive radio-frequency magnetron sputtering

Structural and electrical properties of tantalum nitride thin films fabricated by using reactive radio-frequency magnetron sputtering

Applied Physics A: Materials Science and Processing

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Bibliographic Details
Main Authors: Nie, H.B., Xu, S.Y., Wang, S.J., You, L.P., Yang, Z., Ong, C.K., Li, J., Liew, T.Y.F.
Other Authors: DATA STORAGE INSTITUTE
Format: Article
Published: 2014
Online Access:http://scholarbank.nus.edu.sg/handle/10635/112724
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Institution: National University of Singapore

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http://scholarbank.nus.edu.sg/handle/10635/112724

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