Structural and electrical properties of tantalum nitride thin films fabricated by using reactive radio-frequency magnetron sputtering
Applied Physics A: Materials Science and Processing
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2014
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sg-nus-scholar.10635-1127242015-03-07T14:17:22Z Structural and electrical properties of tantalum nitride thin films fabricated by using reactive radio-frequency magnetron sputtering Nie, H.B. Xu, S.Y. Wang, S.J. You, L.P. Yang, Z. Ong, C.K. Li, J. Liew, T.Y.F. DATA STORAGE INSTITUTE PHYSICS INSTITUTE OF ENGINEERING SCIENCE Applied Physics A: Materials Science and Processing 73 2 229-236 APAMF 2014-11-28T06:50:08Z 2014-11-28T06:50:08Z 2001 Article Nie, H.B.,Xu, S.Y.,Wang, S.J.,You, L.P.,Yang, Z.,Ong, C.K.,Li, J.,Liew, T.Y.F. (2001). Structural and electrical properties of tantalum nitride thin films fabricated by using reactive radio-frequency magnetron sputtering. Applied Physics A: Materials Science and Processing 73 (2) : 229-236. ScholarBank@NUS Repository. 09478396 http://scholarbank.nus.edu.sg/handle/10635/112724 NOT_IN_WOS Scopus |
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National University of Singapore |
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NUS Library |
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Singapore |
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ScholarBank@NUS |
| description |
Applied Physics A: Materials Science and Processing |
| author2 |
DATA STORAGE INSTITUTE |
| author_facet |
DATA STORAGE INSTITUTE Nie, H.B. Xu, S.Y. Wang, S.J. You, L.P. Yang, Z. Ong, C.K. Li, J. Liew, T.Y.F. |
| format |
Article |
| author |
Nie, H.B. Xu, S.Y. Wang, S.J. You, L.P. Yang, Z. Ong, C.K. Li, J. Liew, T.Y.F. |
| spellingShingle |
Nie, H.B. Xu, S.Y. Wang, S.J. You, L.P. Yang, Z. Ong, C.K. Li, J. Liew, T.Y.F. Structural and electrical properties of tantalum nitride thin films fabricated by using reactive radio-frequency magnetron sputtering |
| author_sort |
Nie, H.B. |
| title |
Structural and electrical properties of tantalum nitride thin films fabricated by using reactive radio-frequency magnetron sputtering |
| title_short |
Structural and electrical properties of tantalum nitride thin films fabricated by using reactive radio-frequency magnetron sputtering |
| title_full |
Structural and electrical properties of tantalum nitride thin films fabricated by using reactive radio-frequency magnetron sputtering |
| title_fullStr |
Structural and electrical properties of tantalum nitride thin films fabricated by using reactive radio-frequency magnetron sputtering |
| title_full_unstemmed |
Structural and electrical properties of tantalum nitride thin films fabricated by using reactive radio-frequency magnetron sputtering |
| title_sort |
structural and electrical properties of tantalum nitride thin films fabricated by using reactive radio-frequency magnetron sputtering |
| publishDate |
2014 |
| url |
http://scholarbank.nus.edu.sg/handle/10635/112724 |
| _version_ |
1681094536436121600 |