Structural and electrical properties of tantalum nitride thin films fabricated by using reactive radio-frequency magnetron sputtering

• Main Authors: Nie, H.B., Xu, S.Y., Wang, S.J., You, L.P., Yang, Z., Ong, C.K., Li, J., Liew, T.Y.F.
• Other Authors: DATA STORAGE INSTITUTE
• Format: Article
• Published: 2014
• Online Access: http://scholarbank.nus.edu.sg/handle/10635/112724
• Institution: National University of Singapore

Applied Physics A: Materials Science and Processing