High-resolution synchrotron X-ray reflectivity study of the density of plasma-treated ultra low-k films

• Main Authors: Yang, P., Lu, D., Murthy, B.R., Moser, H.O.
• Other Authors: SINGAPORE SYNCHROTRON LIGHT SOURCE
• Format: Article
• Published: 2014
• Subjects: [B]Atomic force microscopy (AFM); [B]interferometry; [B]roughness; [X]X-ray reflectivity
• Online Access: http://scholarbank.nus.edu.sg/handle/10635/113020
• Institution: National University of Singapore

10.1016/j.surfcoat.2004.10.114