High-resolution synchrotron X-ray reflectivity study of the density of plasma-treated ultra low-k films
10.1016/j.surfcoat.2004.10.114
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sg-nus-scholar.10635-1130202023-10-25T07:41:01Z High-resolution synchrotron X-ray reflectivity study of the density of plasma-treated ultra low-k films Yang, P. Lu, D. Murthy, B.R. Moser, H.O. SINGAPORE SYNCHROTRON LIGHT SOURCE [B]Atomic force microscopy (AFM) [B]interferometry [B]roughness [X]X-ray reflectivity 10.1016/j.surfcoat.2004.10.114 Surface and Coatings Technology 198 1-3 SPEC. ISS. 133-137 2014-11-28T08:43:19Z 2014-11-28T08:43:19Z 2005-08-01 Article Yang, P., Lu, D., Murthy, B.R., Moser, H.O. (2005-08-01). High-resolution synchrotron X-ray reflectivity study of the density of plasma-treated ultra low-k films. Surface and Coatings Technology 198 (1-3 SPEC. ISS.) : 133-137. ScholarBank@NUS Repository. https://doi.org/10.1016/j.surfcoat.2004.10.114 02578972 http://scholarbank.nus.edu.sg/handle/10635/113020 000230419400027 Scopus |
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National University of Singapore |
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NUS Library |
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Asia |
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Singapore Singapore |
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NUS Library |
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| topic |
[B]Atomic force microscopy (AFM) [B]interferometry [B]roughness [X]X-ray reflectivity |
| spellingShingle |
[B]Atomic force microscopy (AFM) [B]interferometry [B]roughness [X]X-ray reflectivity Yang, P. Lu, D. Murthy, B.R. Moser, H.O. High-resolution synchrotron X-ray reflectivity study of the density of plasma-treated ultra low-k films |
| description |
10.1016/j.surfcoat.2004.10.114 |
| author2 |
SINGAPORE SYNCHROTRON LIGHT SOURCE |
| author_facet |
SINGAPORE SYNCHROTRON LIGHT SOURCE Yang, P. Lu, D. Murthy, B.R. Moser, H.O. |
| format |
Article |
| author |
Yang, P. Lu, D. Murthy, B.R. Moser, H.O. |
| author_sort |
Yang, P. |
| title |
High-resolution synchrotron X-ray reflectivity study of the density of plasma-treated ultra low-k films |
| title_short |
High-resolution synchrotron X-ray reflectivity study of the density of plasma-treated ultra low-k films |
| title_full |
High-resolution synchrotron X-ray reflectivity study of the density of plasma-treated ultra low-k films |
| title_fullStr |
High-resolution synchrotron X-ray reflectivity study of the density of plasma-treated ultra low-k films |
| title_full_unstemmed |
High-resolution synchrotron X-ray reflectivity study of the density of plasma-treated ultra low-k films |
| title_sort |
high-resolution synchrotron x-ray reflectivity study of the density of plasma-treated ultra low-k films |
| publishDate |
2014 |
| url |
http://scholarbank.nus.edu.sg/handle/10635/113020 |
| _version_ |
1781789150474665984 |