High-resolution synchrotron X-ray reflectivity study of the density of plasma-treated ultra low-k films

High-resolution synchrotron X-ray reflectivity study of the density of plasma-treated ultra low-k films

10.1016/j.surfcoat.2004.10.114

Saved in:
Bibliographic Details
Main Authors: Yang, P., Lu, D., Murthy, B.R., Moser, H.O.
Other Authors: SINGAPORE SYNCHROTRON LIGHT SOURCE
Format: Article
Published: 2014
Subjects:
[B]Atomic force microscopy (AFM)
[B]interferometry
[B]roughness
[X]X-ray reflectivity
Online Access:http://scholarbank.nus.edu.sg/handle/10635/113020
Tags: Add Tag
No Tags, Be the first to tag this record!
Institution: National University of Singapore
Description
Summary:10.1016/j.surfcoat.2004.10.114

Similar Items