Rapid thermal oxidation of radio frequency sputtered polycrystalline silicon germanium films
10.1063/1.1431435
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sg-nus-scholar.10635-1130982023-10-25T22:10:17Z Rapid thermal oxidation of radio frequency sputtered polycrystalline silicon germanium films Choi, W.K. Natarajan, A. Bera, L.K. Wee, A.T.S. Liu, Y.J. ELECTRICAL & COMPUTER ENGINEERING INSTITUTE OF ENGINEERING SCIENCE PHYSICS 10.1063/1.1431435 Journal of Applied Physics 91 4 2443-2448 JAPIA 2014-11-28T09:11:59Z 2014-11-28T09:11:59Z 2002-02-15 Article Choi, W.K., Natarajan, A., Bera, L.K., Wee, A.T.S., Liu, Y.J. (2002-02-15). Rapid thermal oxidation of radio frequency sputtered polycrystalline silicon germanium films. Journal of Applied Physics 91 (4) : 2443-2448. ScholarBank@NUS Repository. https://doi.org/10.1063/1.1431435 00218979 http://scholarbank.nus.edu.sg/handle/10635/113098 000173553800107 Scopus |
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ELECTRICAL & COMPUTER ENGINEERING |
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ELECTRICAL & COMPUTER ENGINEERING Choi, W.K. Natarajan, A. Bera, L.K. Wee, A.T.S. Liu, Y.J. |
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Choi, W.K. Natarajan, A. Bera, L.K. Wee, A.T.S. Liu, Y.J. |
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Choi, W.K. Natarajan, A. Bera, L.K. Wee, A.T.S. Liu, Y.J. Rapid thermal oxidation of radio frequency sputtered polycrystalline silicon germanium films |
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Choi, W.K. |
title |
Rapid thermal oxidation of radio frequency sputtered polycrystalline silicon germanium films |
title_short |
Rapid thermal oxidation of radio frequency sputtered polycrystalline silicon germanium films |
title_full |
Rapid thermal oxidation of radio frequency sputtered polycrystalline silicon germanium films |
title_fullStr |
Rapid thermal oxidation of radio frequency sputtered polycrystalline silicon germanium films |
title_full_unstemmed |
Rapid thermal oxidation of radio frequency sputtered polycrystalline silicon germanium films |
title_sort |
rapid thermal oxidation of radio frequency sputtered polycrystalline silicon germanium films |
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2014 |
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http://scholarbank.nus.edu.sg/handle/10635/113098 |
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