Rapid thermal oxidation of radio frequency sputtered polycrystalline silicon germanium films

Rapid thermal oxidation of radio frequency sputtered polycrystalline silicon germanium films

10.1063/1.1431435

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Bibliographic Details
Main Authors: Choi, W.K., Natarajan, A., Bera, L.K., Wee, A.T.S., Liu, Y.J.
Other Authors: ELECTRICAL & COMPUTER ENGINEERING
Format: Article
Published: 2014
Online Access:http://scholarbank.nus.edu.sg/handle/10635/113098
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Institution: National University of Singapore

Internet

http://scholarbank.nus.edu.sg/handle/10635/113098

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