Low-temperature surface passivation of moderately doped crystalline silicon by atomic-layer-deposited hafnium oxide films
10.1149/2.026301jss
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2014
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sg-nus-scholar.10635-1132602023-10-30T07:41:29Z Low-temperature surface passivation of moderately doped crystalline silicon by atomic-layer-deposited hafnium oxide films Lin, F. Hoex, B. Koh, Y.H. Lin, J. Aberle, A.G. SOLAR ENERGY RESEARCH INST OF S'PORE ELECTRICAL & COMPUTER ENGINEERING 10.1149/2.026301jss ECS Journal of Solid State Science and Technology 2 1 N11-N14 2014-11-30T06:41:29Z 2014-11-30T06:41:29Z 2013 Article Lin, F., Hoex, B., Koh, Y.H., Lin, J., Aberle, A.G. (2013). Low-temperature surface passivation of moderately doped crystalline silicon by atomic-layer-deposited hafnium oxide films. ECS Journal of Solid State Science and Technology 2 (1) : N11-N14. ScholarBank@NUS Repository. https://doi.org/10.1149/2.026301jss 21628769 http://scholarbank.nus.edu.sg/handle/10635/113260 000319450800005 Scopus |
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National University of Singapore |
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NUS Library |
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Asia |
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Singapore Singapore |
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NUS Library |
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ScholarBank@NUS |
| description |
10.1149/2.026301jss |
| author2 |
SOLAR ENERGY RESEARCH INST OF S'PORE |
| author_facet |
SOLAR ENERGY RESEARCH INST OF S'PORE Lin, F. Hoex, B. Koh, Y.H. Lin, J. Aberle, A.G. |
| format |
Article |
| author |
Lin, F. Hoex, B. Koh, Y.H. Lin, J. Aberle, A.G. |
| spellingShingle |
Lin, F. Hoex, B. Koh, Y.H. Lin, J. Aberle, A.G. Low-temperature surface passivation of moderately doped crystalline silicon by atomic-layer-deposited hafnium oxide films |
| author_sort |
Lin, F. |
| title |
Low-temperature surface passivation of moderately doped crystalline silicon by atomic-layer-deposited hafnium oxide films |
| title_short |
Low-temperature surface passivation of moderately doped crystalline silicon by atomic-layer-deposited hafnium oxide films |
| title_full |
Low-temperature surface passivation of moderately doped crystalline silicon by atomic-layer-deposited hafnium oxide films |
| title_fullStr |
Low-temperature surface passivation of moderately doped crystalline silicon by atomic-layer-deposited hafnium oxide films |
| title_full_unstemmed |
Low-temperature surface passivation of moderately doped crystalline silicon by atomic-layer-deposited hafnium oxide films |
| title_sort |
low-temperature surface passivation of moderately doped crystalline silicon by atomic-layer-deposited hafnium oxide films |
| publishDate |
2014 |
| url |
http://scholarbank.nus.edu.sg/handle/10635/113260 |
| _version_ |
1781789183497469952 |