Low-temperature surface passivation of moderately doped crystalline silicon by atomic-layer-deposited hafnium oxide films

• Main Authors: Lin, F., Hoex, B., Koh, Y.H., Lin, J., Aberle, A.G.
• Other Authors: SOLAR ENERGY RESEARCH INST OF S'PORE
• Format: Article
• Published: 2014
• Online Access: http://scholarbank.nus.edu.sg/handle/10635/113260
• Institution: National University of Singapore

10.1149/2.026301jss