The effect of ultra-thin Al 2O 3 layers on the dielectric properties of LaAlO 3 thin film on silicon

10.1088/0268-1242/19/7/027

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Bibliographic Details
Main Authors: Yan, L., Kong, L.B., Ong, C.K.
Other Authors: TEMASEK LABORATORIES
Format: Article
Published: 2014
Online Access:http://scholarbank.nus.edu.sg/handle/10635/115320
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Institution: National University of Singapore
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