The effect of ultra-thin Al 2O 3 layers on the dielectric properties of LaAlO 3 thin film on silicon
10.1088/0268-1242/19/7/027
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Main Authors: | Yan, L., Kong, L.B., Ong, C.K. |
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Other Authors: | TEMASEK LABORATORIES |
Format: | Article |
Published: |
2014
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Online Access: | http://scholarbank.nus.edu.sg/handle/10635/115320 |
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Institution: | National University of Singapore |
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