Kinetics of Ge diffusion, desorption and pit formation dynamics during annealing of Si0.8Ge0.2/Si(001) virtual substrates

10.1039/b927274g

Saved in:
Bibliographic Details
Main Authors: Zhang, Z., Pan, J.S., Zhang, J., Tok, E.S.
Other Authors: PHYSICS
Format: Article
Published: 2014
Online Access:http://scholarbank.nus.edu.sg/handle/10635/115786
Tags: Add Tag
No Tags, Be the first to tag this record!
Institution: National University of Singapore