Kinetics of Ge diffusion, desorption and pit formation dynamics during annealing of Si0.8Ge0.2/Si(001) virtual substrates
10.1039/b927274g
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Main Authors: | Zhang, Z., Pan, J.S., Zhang, J., Tok, E.S. |
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Other Authors: | PHYSICS |
Format: | Article |
Published: |
2014
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Online Access: | http://scholarbank.nus.edu.sg/handle/10635/115786 |
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Institution: | National University of Singapore |
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