Kinetics of Ge diffusion, desorption and pit formation dynamics during annealing of Si0.8Ge0.2/Si(001) virtual substrates
10.1039/b927274g
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2014
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sg-nus-scholar.10635-1157862024-11-15T07:05:16Z Kinetics of Ge diffusion, desorption and pit formation dynamics during annealing of Si0.8Ge0.2/Si(001) virtual substrates Zhang, Z. Pan, J.S. Zhang, J. Tok, E.S. PHYSICS INST OF MATERIALS RESEARCH & ENGINEERING 10.1039/b927274g Physical Chemistry Chemical Physics 12 26 7171-7183 PPCPF 2014-12-12T07:32:28Z 2014-12-12T07:32:28Z 2010-07-14 Article Zhang, Z., Pan, J.S., Zhang, J., Tok, E.S. (2010-07-14). Kinetics of Ge diffusion, desorption and pit formation dynamics during annealing of Si0.8Ge0.2/Si(001) virtual substrates. Physical Chemistry Chemical Physics 12 (26) : 7171-7183. ScholarBank@NUS Repository. https://doi.org/10.1039/b927274g 14639076 http://scholarbank.nus.edu.sg/handle/10635/115786 000279098300032 Scopus |
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National University of Singapore |
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Asia |
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Singapore Singapore |
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| description |
10.1039/b927274g |
| author2 |
PHYSICS |
| author_facet |
PHYSICS Zhang, Z. Pan, J.S. Zhang, J. Tok, E.S. |
| format |
Article |
| author |
Zhang, Z. Pan, J.S. Zhang, J. Tok, E.S. |
| spellingShingle |
Zhang, Z. Pan, J.S. Zhang, J. Tok, E.S. Kinetics of Ge diffusion, desorption and pit formation dynamics during annealing of Si0.8Ge0.2/Si(001) virtual substrates |
| author_sort |
Zhang, Z. |
| title |
Kinetics of Ge diffusion, desorption and pit formation dynamics during annealing of Si0.8Ge0.2/Si(001) virtual substrates |
| title_short |
Kinetics of Ge diffusion, desorption and pit formation dynamics during annealing of Si0.8Ge0.2/Si(001) virtual substrates |
| title_full |
Kinetics of Ge diffusion, desorption and pit formation dynamics during annealing of Si0.8Ge0.2/Si(001) virtual substrates |
| title_fullStr |
Kinetics of Ge diffusion, desorption and pit formation dynamics during annealing of Si0.8Ge0.2/Si(001) virtual substrates |
| title_full_unstemmed |
Kinetics of Ge diffusion, desorption and pit formation dynamics during annealing of Si0.8Ge0.2/Si(001) virtual substrates |
| title_sort |
kinetics of ge diffusion, desorption and pit formation dynamics during annealing of si0.8ge0.2/si(001) virtual substrates |
| publishDate |
2014 |
| url |
http://scholarbank.nus.edu.sg/handle/10635/115786 |
| _version_ |
1821204034722201600 |