Roughening behavior in Si/SiGe heterostructures under O2 + bombardment

10.1016/S0168-583X(03)01711-7

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Bibliographic Details
Main Authors: Lau, G.S., Tok, E.S., Liu, R., Wee, A.T.S., Zhang, J.
Other Authors: INSTITUTE OF ENGINEERING SCIENCE
Format: Article
Published: 2014
Online Access:http://scholarbank.nus.edu.sg/handle/10635/113101
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Institution: National University of Singapore