Ultrathin oxide interfaces on 6H-SiC formed by plasma hydrogenation: Ultra shallow depth profile study
10.1063/1.1509100
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sg-nus-scholar.10635-1160182023-10-30T10:11:50Z Ultrathin oxide interfaces on 6H-SiC formed by plasma hydrogenation: Ultra shallow depth profile study Xie, X. Loh, K.P. CHEMISTRY NUS NANOSCIENCE & NANOTECH INITIATIVE 10.1063/1.1509100 Journal of Applied Physics 92 9 5173-5176 JAPIA 2014-12-12T07:35:22Z 2014-12-12T07:35:22Z 2002-11-01 Article Xie, X., Loh, K.P. (2002-11-01). Ultrathin oxide interfaces on 6H-SiC formed by plasma hydrogenation: Ultra shallow depth profile study. Journal of Applied Physics 92 (9) : 5173-5176. ScholarBank@NUS Repository. https://doi.org/10.1063/1.1509100 00218979 http://scholarbank.nus.edu.sg/handle/10635/116018 000178767200047 Scopus |
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National University of Singapore |
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Asia |
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Singapore Singapore |
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| description |
10.1063/1.1509100 |
| author2 |
CHEMISTRY |
| author_facet |
CHEMISTRY Xie, X. Loh, K.P. |
| format |
Article |
| author |
Xie, X. Loh, K.P. |
| spellingShingle |
Xie, X. Loh, K.P. Ultrathin oxide interfaces on 6H-SiC formed by plasma hydrogenation: Ultra shallow depth profile study |
| author_sort |
Xie, X. |
| title |
Ultrathin oxide interfaces on 6H-SiC formed by plasma hydrogenation: Ultra shallow depth profile study |
| title_short |
Ultrathin oxide interfaces on 6H-SiC formed by plasma hydrogenation: Ultra shallow depth profile study |
| title_full |
Ultrathin oxide interfaces on 6H-SiC formed by plasma hydrogenation: Ultra shallow depth profile study |
| title_fullStr |
Ultrathin oxide interfaces on 6H-SiC formed by plasma hydrogenation: Ultra shallow depth profile study |
| title_full_unstemmed |
Ultrathin oxide interfaces on 6H-SiC formed by plasma hydrogenation: Ultra shallow depth profile study |
| title_sort |
ultrathin oxide interfaces on 6h-sic formed by plasma hydrogenation: ultra shallow depth profile study |
| publishDate |
2014 |
| url |
http://scholarbank.nus.edu.sg/handle/10635/116018 |
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1781789467779006464 |