Microlithography: Control of temperature and resist thickness

Ph.D

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Bibliographic Details
Main Author: LEE LAY LAY
Other Authors: ELECTRICAL & COMPUTER ENGINEERING
Format: Theses and Dissertations
Language:English
Published: 2010
Subjects:
Online Access:http://scholarbank.nus.edu.sg/handle/10635/13786
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Institution: National University of Singapore
Language: English
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spelling sg-nus-scholar.10635-137862015-01-27T08:08:19Z Microlithography: Control of temperature and resist thickness LEE LAY LAY ELECTRICAL & COMPUTER ENGINEERING HO WENG KHUEN LOH AI POH lithography, model-based, real-time, feedforward, temperature, thickness Ph.D DOCTOR OF PHILOSOPHY 2010-04-08T10:36:27Z 2010-04-08T10:36:27Z 2004-03-06 Thesis LEE LAY LAY (2004-03-06). Microlithography: Control of temperature and resist thickness. ScholarBank@NUS Repository. http://scholarbank.nus.edu.sg/handle/10635/13786 NOT_IN_WOS en
institution National University of Singapore
building NUS Library
country Singapore
collection ScholarBank@NUS
language English
topic lithography, model-based, real-time, feedforward, temperature, thickness
spellingShingle lithography, model-based, real-time, feedforward, temperature, thickness
LEE LAY LAY
Microlithography: Control of temperature and resist thickness
description Ph.D
author2 ELECTRICAL & COMPUTER ENGINEERING
author_facet ELECTRICAL & COMPUTER ENGINEERING
LEE LAY LAY
format Theses and Dissertations
author LEE LAY LAY
author_sort LEE LAY LAY
title Microlithography: Control of temperature and resist thickness
title_short Microlithography: Control of temperature and resist thickness
title_full Microlithography: Control of temperature and resist thickness
title_fullStr Microlithography: Control of temperature and resist thickness
title_full_unstemmed Microlithography: Control of temperature and resist thickness
title_sort microlithography: control of temperature and resist thickness
publishDate 2010
url http://scholarbank.nus.edu.sg/handle/10635/13786
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