Microlithography: Control of temperature and resist thickness
Ph.D
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sg-nus-scholar.10635-137862015-01-27T08:08:19Z Microlithography: Control of temperature and resist thickness LEE LAY LAY ELECTRICAL & COMPUTER ENGINEERING HO WENG KHUEN LOH AI POH lithography, model-based, real-time, feedforward, temperature, thickness Ph.D DOCTOR OF PHILOSOPHY 2010-04-08T10:36:27Z 2010-04-08T10:36:27Z 2004-03-06 Thesis LEE LAY LAY (2004-03-06). Microlithography: Control of temperature and resist thickness. ScholarBank@NUS Repository. http://scholarbank.nus.edu.sg/handle/10635/13786 NOT_IN_WOS en |
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National University of Singapore |
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Singapore |
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ScholarBank@NUS |
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English |
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lithography, model-based, real-time, feedforward, temperature, thickness |
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lithography, model-based, real-time, feedforward, temperature, thickness LEE LAY LAY Microlithography: Control of temperature and resist thickness |
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Ph.D |
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ELECTRICAL & COMPUTER ENGINEERING |
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ELECTRICAL & COMPUTER ENGINEERING LEE LAY LAY |
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Theses and Dissertations |
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LEE LAY LAY |
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LEE LAY LAY |
title |
Microlithography: Control of temperature and resist thickness |
title_short |
Microlithography: Control of temperature and resist thickness |
title_full |
Microlithography: Control of temperature and resist thickness |
title_fullStr |
Microlithography: Control of temperature and resist thickness |
title_full_unstemmed |
Microlithography: Control of temperature and resist thickness |
title_sort |
microlithography: control of temperature and resist thickness |
publishDate |
2010 |
url |
http://scholarbank.nus.edu.sg/handle/10635/13786 |
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