Interfaces at crystalline metal gate/high-k oxide/Si stacks: Characterizations and atomistic modeling

Interfaces at crystalline metal gate/high-k oxide/Si stacks: Characterizations and atomistic modeling

Ph.D

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Bibliographic Details
Main Author: DONG YUFENG
Other Authors: PHYSICS
Format: Theses and Dissertations
Language:English
Published: 2010
Subjects:
high-k dielectric, metal gate, x-ray photoemission spectroscopy, transmission electron microscopy, first-principles calculations
Online Access:http://scholarbank.nus.edu.sg/handle/10635/15379
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Institution: National University of Singapore
Language: English

Internet

http://scholarbank.nus.edu.sg/handle/10635/15379

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