Interfaces at crystalline metal gate/high-k oxide/Si stacks: Characterizations and atomistic modeling

Ph.D

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Main Author:	DONG YUFENG
Other Authors:	PHYSICS
Format:	Theses and Dissertations
Language:	English
Published:	2010
Subjects:	high-k dielectric, metal gate, x-ray photoemission spectroscopy, transmission electron microscopy, first-principles calculations
Online Access:	http://scholarbank.nus.edu.sg/handle/10635/15379
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Institution:	National University of Singapore
Language:	English

id	sg-nus-scholar.10635-15379
record_format	dspace
spelling	sg-nus-scholar.10635-153792015-01-27T05:58:54Z Interfaces at crystalline metal gate/high-k oxide/Si stacks: Characterizations and atomistic modeling DONG YUFENG PHYSICS FENG YUAN PING high-k dielectric, metal gate, x-ray photoemission spectroscopy, transmission electron microscopy, first-principles calculations Ph.D DOCTOR OF PHILOSOPHY 2010-04-08T10:52:54Z 2010-04-08T10:52:54Z 2006-07-19 Thesis DONG YUFENG (2006-07-19). Interfaces at crystalline metal gate/high-k oxide/Si stacks: Characterizations and atomistic modeling. ScholarBank@NUS Repository. http://scholarbank.nus.edu.sg/handle/10635/15379 NOT_IN_WOS en
institution	National University of Singapore
building	NUS Library
country	Singapore
collection	ScholarBank@NUS
language	English
topic	high-k dielectric, metal gate, x-ray photoemission spectroscopy, transmission electron microscopy, first-principles calculations
spellingShingle	high-k dielectric, metal gate, x-ray photoemission spectroscopy, transmission electron microscopy, first-principles calculations DONG YUFENG Interfaces at crystalline metal gate/high-k oxide/Si stacks: Characterizations and atomistic modeling
description	Ph.D
author2	PHYSICS
author_facet	PHYSICS DONG YUFENG
format	Theses and Dissertations
author	DONG YUFENG
author_sort	DONG YUFENG
title	Interfaces at crystalline metal gate/high-k oxide/Si stacks: Characterizations and atomistic modeling
title_short	Interfaces at crystalline metal gate/high-k oxide/Si stacks: Characterizations and atomistic modeling
title_full	Interfaces at crystalline metal gate/high-k oxide/Si stacks: Characterizations and atomistic modeling
title_fullStr	Interfaces at crystalline metal gate/high-k oxide/Si stacks: Characterizations and atomistic modeling
title_full_unstemmed	Interfaces at crystalline metal gate/high-k oxide/Si stacks: Characterizations and atomistic modeling
title_sort	interfaces at crystalline metal gate/high-k oxide/si stacks: characterizations and atomistic modeling
publishDate	2010
url	http://scholarbank.nus.edu.sg/handle/10635/15379
_version_	1681079184828399616

Interfaces at crystalline metal gate/high-k oxide/Si stacks: Characterizations and atomistic modeling

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