PATTERNING OF HAFNIUM ALUMINIUM OXIDE/POLY-SI GATE STACK FOR ADVANCED CMOS APPLICATIONS

PATTERNING OF HAFNIUM ALUMINIUM OXIDE/POLY-SI GATE STACK FOR ADVANCED CMOS APPLICATIONS

Master's

Saved in:
Bibliographic Details
Main Author: ARDIANTO WIRASENTANA
Other Authors: SINGAPORE-MIT ALLIANCE
Format: Theses and Dissertations
Published: 2019
Subjects:
High-κ
Dielectrics
HfAlO
CMOS
Etching
Selectivity
TaN
Sidewall bowing
Microtrenching
Polymer film
Online Access:https://scholarbank.nus.edu.sg/handle/10635/153901
Tags: Add Tag
No Tags, Be the first to tag this record!
Institution: National University of Singapore
id sg-nus-scholar.10635-153901
record_format dspace
spelling sg-nus-scholar.10635-1539012024-10-26T00:11:42Z PATTERNING OF HAFNIUM ALUMINIUM OXIDE/POLY-SI GATE STACK FOR ADVANCED CMOS APPLICATIONS ARDIANTO WIRASENTANA SINGAPORE-MIT ALLIANCE SHAJAN MATHEW CHIM WAI KIN High-κ Dielectrics HfAlO CMOS Etching Selectivity TaN Sidewall bowing Microtrenching Polymer film Master's MASTER OF SCIENCE IN ADVANCED MATERIALS FOR MICRO- & NANO- SYSTEMS Dissertation Advisors: 1. Shajan Mathew, Senior Research Engineer, SPT Lab., IME. 2. Assoc. Prof. Chim Wai Kin, SMA Fellow, NUS. 2019-05-09T05:30:32Z 2019-05-09T05:30:32Z 2003 Thesis ARDIANTO WIRASENTANA (2003). PATTERNING OF HAFNIUM ALUMINIUM OXIDE/POLY-SI GATE STACK FOR ADVANCED CMOS APPLICATIONS. ScholarBank@NUS Repository. https://scholarbank.nus.edu.sg/handle/10635/153901 SMA BATCHLOAD 20190422
institution National University of Singapore
building NUS Library
continent Asia
country Singapore
Singapore
content_provider NUS Library
collection ScholarBank@NUS
topic High-κ
Dielectrics
HfAlO
CMOS
Etching
Selectivity
TaN
Sidewall bowing
Microtrenching
Polymer film
spellingShingle High-κ
Dielectrics
HfAlO
CMOS
Etching
Selectivity
TaN
Sidewall bowing
Microtrenching
Polymer film
ARDIANTO WIRASENTANA
PATTERNING OF HAFNIUM ALUMINIUM OXIDE/POLY-SI GATE STACK FOR ADVANCED CMOS APPLICATIONS
description Master's
author2 SINGAPORE-MIT ALLIANCE
author_facet SINGAPORE-MIT ALLIANCE
ARDIANTO WIRASENTANA
format Theses and Dissertations
author ARDIANTO WIRASENTANA
author_sort ARDIANTO WIRASENTANA
title PATTERNING OF HAFNIUM ALUMINIUM OXIDE/POLY-SI GATE STACK FOR ADVANCED CMOS APPLICATIONS
title_short PATTERNING OF HAFNIUM ALUMINIUM OXIDE/POLY-SI GATE STACK FOR ADVANCED CMOS APPLICATIONS
title_full PATTERNING OF HAFNIUM ALUMINIUM OXIDE/POLY-SI GATE STACK FOR ADVANCED CMOS APPLICATIONS
title_fullStr PATTERNING OF HAFNIUM ALUMINIUM OXIDE/POLY-SI GATE STACK FOR ADVANCED CMOS APPLICATIONS
title_full_unstemmed PATTERNING OF HAFNIUM ALUMINIUM OXIDE/POLY-SI GATE STACK FOR ADVANCED CMOS APPLICATIONS
title_sort patterning of hafnium aluminium oxide/poly-si gate stack for advanced cmos applications
publishDate 2019
url https://scholarbank.nus.edu.sg/handle/10635/153901
_version_ 1821199400963145728

Similar Items