STUDY OF PROCESS IMPACT ON K VALUE OF LOW K DIELECTRIC MATERIAL USED IN CU / LOW K DUAL DAMASCENE INTERCONNECT
Master's
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2019
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sg-nus-scholar.10635-1541332024-10-26T00:12:16Z STUDY OF PROCESS IMPACT ON K VALUE OF LOW K DIELECTRIC MATERIAL USED IN CU / LOW K DUAL DAMASCENE INTERCONNECT WONG KAH LEONG SINGAPORE-MIT ALLIANCE JEFFREY SU YONG JIE PEY KIN LEONG Low k dielectric CVD CoralTM Etching Plasma treatment Stripping Ashing Cleaning Integrated k Master's MASTER OF SCIENCE IN ADVANCED MATERIALS FOR MICRO- & NANO- SYSTEMS Dissertation Advisor: 1. Assoc. Prof. Pey Kin Leong, SMA Fellow, NTU, IME Supervisor: Dr. Jeffrey Su Yong Jie, Technical Manager, SPT Laboratory 2019-05-15T04:18:32Z 2019-05-15T04:18:32Z 2003 Thesis WONG KAH LEONG (2003). STUDY OF PROCESS IMPACT ON K VALUE OF LOW K DIELECTRIC MATERIAL USED IN CU / LOW K DUAL DAMASCENE INTERCONNECT. ScholarBank@NUS Repository. https://scholarbank.nus.edu.sg/handle/10635/154133 SMA BATCHLOAD 20190422 |
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Low k dielectric CVD CoralTM Etching Plasma treatment Stripping Ashing Cleaning Integrated k |
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Low k dielectric CVD CoralTM Etching Plasma treatment Stripping Ashing Cleaning Integrated k WONG KAH LEONG STUDY OF PROCESS IMPACT ON K VALUE OF LOW K DIELECTRIC MATERIAL USED IN CU / LOW K DUAL DAMASCENE INTERCONNECT |
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Master's |
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SINGAPORE-MIT ALLIANCE |
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SINGAPORE-MIT ALLIANCE WONG KAH LEONG |
format |
Theses and Dissertations |
author |
WONG KAH LEONG |
author_sort |
WONG KAH LEONG |
title |
STUDY OF PROCESS IMPACT ON K VALUE OF LOW K DIELECTRIC MATERIAL USED IN CU / LOW K DUAL DAMASCENE INTERCONNECT |
title_short |
STUDY OF PROCESS IMPACT ON K VALUE OF LOW K DIELECTRIC MATERIAL USED IN CU / LOW K DUAL DAMASCENE INTERCONNECT |
title_full |
STUDY OF PROCESS IMPACT ON K VALUE OF LOW K DIELECTRIC MATERIAL USED IN CU / LOW K DUAL DAMASCENE INTERCONNECT |
title_fullStr |
STUDY OF PROCESS IMPACT ON K VALUE OF LOW K DIELECTRIC MATERIAL USED IN CU / LOW K DUAL DAMASCENE INTERCONNECT |
title_full_unstemmed |
STUDY OF PROCESS IMPACT ON K VALUE OF LOW K DIELECTRIC MATERIAL USED IN CU / LOW K DUAL DAMASCENE INTERCONNECT |
title_sort |
study of process impact on k value of low k dielectric material used in cu / low k dual damascene interconnect |
publishDate |
2019 |
url |
https://scholarbank.nus.edu.sg/handle/10635/154133 |
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1821204011655626752 |