Ultrashallow junction formation for next generation MOS technology

Ultrashallow junction formation for next generation MOS technology

Ph.D

Saved in:
Bibliographic Details
Main Author: POON CHYIU HYIA, DEBORA
Other Authors: ELECTRICAL & COMPUTER ENGINEERING
Format: Theses and Dissertations
Language:English
Published: 2010
Subjects:
Junction, Laser, Silicon, Germanium, Annealing, Activation
Online Access:http://scholarbank.nus.edu.sg/handle/10635/15466
Tags: Add Tag
No Tags, Be the first to tag this record!
Institution: National University of Singapore
Language: English
id sg-nus-scholar.10635-15466
record_format dspace
spelling sg-nus-scholar.10635-154662015-02-02T15:03:41Z Ultrashallow junction formation for next generation MOS technology POON CHYIU HYIA, DEBORA ELECTRICAL & COMPUTER ENGINEERING TAN LENG SEOW CHO BYUNG-JIN Junction, Laser, Silicon, Germanium, Annealing, Activation Ph.D DOCTOR OF PHILOSOPHY 2010-04-08T10:53:49Z 2010-04-08T10:53:49Z 2006-08-03 Thesis POON CHYIU HYIA, DEBORA (2006-08-03). Ultrashallow junction formation for next generation MOS technology. ScholarBank@NUS Repository. http://scholarbank.nus.edu.sg/handle/10635/15466 NOT_IN_WOS en
institution National University of Singapore
building NUS Library
country Singapore
collection ScholarBank@NUS
language English
topic Junction, Laser, Silicon, Germanium, Annealing, Activation
spellingShingle Junction, Laser, Silicon, Germanium, Annealing, Activation
POON CHYIU HYIA, DEBORA
Ultrashallow junction formation for next generation MOS technology
description Ph.D
author2 ELECTRICAL & COMPUTER ENGINEERING
author_facet ELECTRICAL & COMPUTER ENGINEERING
POON CHYIU HYIA, DEBORA
format Theses and Dissertations
author POON CHYIU HYIA, DEBORA
author_sort POON CHYIU HYIA, DEBORA
title Ultrashallow junction formation for next generation MOS technology
title_short Ultrashallow junction formation for next generation MOS technology
title_full Ultrashallow junction formation for next generation MOS technology
title_fullStr Ultrashallow junction formation for next generation MOS technology
title_full_unstemmed Ultrashallow junction formation for next generation MOS technology
title_sort ultrashallow junction formation for next generation mos technology
publishDate 2010
url http://scholarbank.nus.edu.sg/handle/10635/15466
_version_ 1681079199438209024

Similar Items