High-quality doped polycrystalline silicon using low-pressure chemical vapor deposition (LPCVD)

10.1016/j.egypro.2018.09.014

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Bibliographic Details
Main Authors: Padhamnath, P, Nandakumar, N, Kitz, BJ, Balaji, N, Naval, MJ, Shanmugam, V, Duttagupta, S
Other Authors: SOLAR ENERGY RESEARCH INST OF S'PORE
Format: Conference or Workshop Item
Published: Elsevier BV 2019
Online Access:https://scholarbank.nus.edu.sg/handle/10635/155039
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Institution: National University of Singapore
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spelling sg-nus-scholar.10635-1550392023-09-08T09:17:14Z High-quality doped polycrystalline silicon using low-pressure chemical vapor deposition (LPCVD) Padhamnath, P Nandakumar, N Kitz, BJ Balaji, N Naval, MJ Shanmugam, V Duttagupta, S SOLAR ENERGY RESEARCH INST OF S'PORE 10.1016/j.egypro.2018.09.014 Energy Procedia 150 9-14 2019-06-03T04:31:12Z 2019-06-03T04:31:12Z 2018-01-01 2019-06-03T01:36:07Z Conference Paper Padhamnath, P, Nandakumar, N, Kitz, BJ, Balaji, N, Naval, MJ, Shanmugam, V, Duttagupta, S (2018-01-01). High-quality doped polycrystalline silicon using low-pressure chemical vapor deposition (LPCVD). Energy Procedia 150 : 9-14. ScholarBank@NUS Repository. https://doi.org/10.1016/j.egypro.2018.09.014 1876-6102 https://scholarbank.nus.edu.sg/handle/10635/155039 Elsevier BV Elements
institution National University of Singapore
building NUS Library
continent Asia
country Singapore
Singapore
content_provider NUS Library
collection ScholarBank@NUS
description 10.1016/j.egypro.2018.09.014
author2 SOLAR ENERGY RESEARCH INST OF S'PORE
author_facet SOLAR ENERGY RESEARCH INST OF S'PORE
Padhamnath, P
Nandakumar, N
Kitz, BJ
Balaji, N
Naval, MJ
Shanmugam, V
Duttagupta, S
format Conference or Workshop Item
author Padhamnath, P
Nandakumar, N
Kitz, BJ
Balaji, N
Naval, MJ
Shanmugam, V
Duttagupta, S
spellingShingle Padhamnath, P
Nandakumar, N
Kitz, BJ
Balaji, N
Naval, MJ
Shanmugam, V
Duttagupta, S
High-quality doped polycrystalline silicon using low-pressure chemical vapor deposition (LPCVD)
author_sort Padhamnath, P
title High-quality doped polycrystalline silicon using low-pressure chemical vapor deposition (LPCVD)
title_short High-quality doped polycrystalline silicon using low-pressure chemical vapor deposition (LPCVD)
title_full High-quality doped polycrystalline silicon using low-pressure chemical vapor deposition (LPCVD)
title_fullStr High-quality doped polycrystalline silicon using low-pressure chemical vapor deposition (LPCVD)
title_full_unstemmed High-quality doped polycrystalline silicon using low-pressure chemical vapor deposition (LPCVD)
title_sort high-quality doped polycrystalline silicon using low-pressure chemical vapor deposition (lpcvd)
publisher Elsevier BV
publishDate 2019
url https://scholarbank.nus.edu.sg/handle/10635/155039
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