High-quality doped polycrystalline silicon using low-pressure chemical vapor deposition (LPCVD)
10.1016/j.egypro.2018.09.014
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2019
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sg-nus-scholar.10635-1550392023-09-08T09:17:14Z High-quality doped polycrystalline silicon using low-pressure chemical vapor deposition (LPCVD) Padhamnath, P Nandakumar, N Kitz, BJ Balaji, N Naval, MJ Shanmugam, V Duttagupta, S SOLAR ENERGY RESEARCH INST OF S'PORE 10.1016/j.egypro.2018.09.014 Energy Procedia 150 9-14 2019-06-03T04:31:12Z 2019-06-03T04:31:12Z 2018-01-01 2019-06-03T01:36:07Z Conference Paper Padhamnath, P, Nandakumar, N, Kitz, BJ, Balaji, N, Naval, MJ, Shanmugam, V, Duttagupta, S (2018-01-01). High-quality doped polycrystalline silicon using low-pressure chemical vapor deposition (LPCVD). Energy Procedia 150 : 9-14. ScholarBank@NUS Repository. https://doi.org/10.1016/j.egypro.2018.09.014 1876-6102 https://scholarbank.nus.edu.sg/handle/10635/155039 Elsevier BV Elements |
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10.1016/j.egypro.2018.09.014 |
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SOLAR ENERGY RESEARCH INST OF S'PORE |
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SOLAR ENERGY RESEARCH INST OF S'PORE Padhamnath, P Nandakumar, N Kitz, BJ Balaji, N Naval, MJ Shanmugam, V Duttagupta, S |
format |
Conference or Workshop Item |
author |
Padhamnath, P Nandakumar, N Kitz, BJ Balaji, N Naval, MJ Shanmugam, V Duttagupta, S |
spellingShingle |
Padhamnath, P Nandakumar, N Kitz, BJ Balaji, N Naval, MJ Shanmugam, V Duttagupta, S High-quality doped polycrystalline silicon using low-pressure chemical vapor deposition (LPCVD) |
author_sort |
Padhamnath, P |
title |
High-quality doped polycrystalline silicon using low-pressure chemical vapor deposition (LPCVD) |
title_short |
High-quality doped polycrystalline silicon using low-pressure chemical vapor deposition (LPCVD) |
title_full |
High-quality doped polycrystalline silicon using low-pressure chemical vapor deposition (LPCVD) |
title_fullStr |
High-quality doped polycrystalline silicon using low-pressure chemical vapor deposition (LPCVD) |
title_full_unstemmed |
High-quality doped polycrystalline silicon using low-pressure chemical vapor deposition (LPCVD) |
title_sort |
high-quality doped polycrystalline silicon using low-pressure chemical vapor deposition (lpcvd) |
publisher |
Elsevier BV |
publishDate |
2019 |
url |
https://scholarbank.nus.edu.sg/handle/10635/155039 |
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1778169052417490944 |