Low-Absorbing and Thermally Stable Industrial Silicon Nitride Films With Very Low Surface Recombination

10.1109/JPHOTOV.2017.2706424

Saved in:

Bibliographic Details
Main Authors:	Hameiri, Ziv, Borojevic, Nino, Mai, Ly, Nandakumar, Naomi, Kim, Kyung, Winderbaum, Saul
Other Authors:	SOLAR ENERGY RESEARCH INST OF S'PORE
Format:	Article
Language:	English
Published:	IEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC 2019
Subjects:	Science & Technology Technology Physical Sciences Energy & Fuels Materials Science, Multidisciplinary Physics, Applied Materials Science Physics Photovoltaic cells silicon silicon nitride surface passivation INTRINSIC CARRIER DENSITY CHEMICAL-VAPOR-DEPOSITION CRYSTALLINE SILICON SOLAR-CELLS PASSIVATION HYDROGEN SI J(0)-ANALYSIS PECVD
Online Access:	https://scholarbank.nus.edu.sg/handle/10635/155041
Tags:	Add Tag No Tags, Be the first to tag this record!
Institution:	National University of Singapore
Language:	English

id	sg-nus-scholar.10635-155041
record_format	dspace
spelling	sg-nus-scholar.10635-1550412023-09-08T09:17:13Z Low-Absorbing and Thermally Stable Industrial Silicon Nitride Films With Very Low Surface Recombination Hameiri, Ziv Borojevic, Nino Mai, Ly Nandakumar, Naomi Kim, Kyung Winderbaum, Saul SOLAR ENERGY RESEARCH INST OF S'PORE Science & Technology Technology Physical Sciences Energy & Fuels Materials Science, Multidisciplinary Physics, Applied Materials Science Physics Photovoltaic cells silicon silicon nitride surface passivation INTRINSIC CARRIER DENSITY CHEMICAL-VAPOR-DEPOSITION CRYSTALLINE SILICON SOLAR-CELLS PASSIVATION HYDROGEN SI J(0)-ANALYSIS PECVD 10.1109/JPHOTOV.2017.2706424 IEEE JOURNAL OF PHOTOVOLTAICS 7 4 996-1003 2019-06-03T04:32:17Z 2019-06-03T04:32:17Z 2017-07-01 2019-06-03T01:37:30Z Article Hameiri, Ziv, Borojevic, Nino, Mai, Ly, Nandakumar, Naomi, Kim, Kyung, Winderbaum, Saul (2017-07-01). Low-Absorbing and Thermally Stable Industrial Silicon Nitride Films With Very Low Surface Recombination. IEEE JOURNAL OF PHOTOVOLTAICS 7 (4) : 996-1003. ScholarBank@NUS Repository. https://doi.org/10.1109/JPHOTOV.2017.2706424 2156-3381 2156-3403 https://scholarbank.nus.edu.sg/handle/10635/155041 en IEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC Elements
institution	National University of Singapore
building	NUS Library
continent	Asia
country	Singapore Singapore
content_provider	NUS Library
collection	ScholarBank@NUS
language	English
topic	Science & Technology Technology Physical Sciences Energy & Fuels Materials Science, Multidisciplinary Physics, Applied Materials Science Physics Photovoltaic cells silicon silicon nitride surface passivation INTRINSIC CARRIER DENSITY CHEMICAL-VAPOR-DEPOSITION CRYSTALLINE SILICON SOLAR-CELLS PASSIVATION HYDROGEN SI J(0)-ANALYSIS PECVD
spellingShingle	Science & Technology Technology Physical Sciences Energy & Fuels Materials Science, Multidisciplinary Physics, Applied Materials Science Physics Photovoltaic cells silicon silicon nitride surface passivation INTRINSIC CARRIER DENSITY CHEMICAL-VAPOR-DEPOSITION CRYSTALLINE SILICON SOLAR-CELLS PASSIVATION HYDROGEN SI J(0)-ANALYSIS PECVD Hameiri, Ziv Borojevic, Nino Mai, Ly Nandakumar, Naomi Kim, Kyung Winderbaum, Saul Low-Absorbing and Thermally Stable Industrial Silicon Nitride Films With Very Low Surface Recombination
description	10.1109/JPHOTOV.2017.2706424
author2	SOLAR ENERGY RESEARCH INST OF S'PORE
author_facet	SOLAR ENERGY RESEARCH INST OF S'PORE Hameiri, Ziv Borojevic, Nino Mai, Ly Nandakumar, Naomi Kim, Kyung Winderbaum, Saul
format	Article
author	Hameiri, Ziv Borojevic, Nino Mai, Ly Nandakumar, Naomi Kim, Kyung Winderbaum, Saul
author_sort	Hameiri, Ziv
title	Low-Absorbing and Thermally Stable Industrial Silicon Nitride Films With Very Low Surface Recombination
title_short	Low-Absorbing and Thermally Stable Industrial Silicon Nitride Films With Very Low Surface Recombination
title_full	Low-Absorbing and Thermally Stable Industrial Silicon Nitride Films With Very Low Surface Recombination
title_fullStr	Low-Absorbing and Thermally Stable Industrial Silicon Nitride Films With Very Low Surface Recombination
title_full_unstemmed	Low-Absorbing and Thermally Stable Industrial Silicon Nitride Films With Very Low Surface Recombination
title_sort	low-absorbing and thermally stable industrial silicon nitride films with very low surface recombination
publisher	IEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC
publishDate	2019
url	https://scholarbank.nus.edu.sg/handle/10635/155041
_version_	1778169052595748864

Low-Absorbing and Thermally Stable Industrial Silicon Nitride Films With Very Low Surface Recombination

Similar Items