Transient Clustering of Reaction Intermediates during Wet Etching of Silicon Nanostructures

• Main Authors: ZAINUL AABDIN, Xiu Mei Xu, Soumyo Sen, UTKARSH ANAND, Petr Kral, Frank Holsteyns, UTKUR MIRZIYODOVICH MIRSAIDOV
• Other Authors: CENTRE FOR ADVANCED 2D MATERIALS
• Format: Article
• Language: English
• Published: Nano Letters 2020
• Subjects: Etching,Molecules,Silicon,Transmission electron microscopy,Nanoclusters
• Online Access: https://scholarbank.nus.edu.sg/handle/10635/177680
• Institution: National University of Singapore

10.1021/acs.nanolett.7b00196