Development and characterization of high-k dielectric/germanium gate stack

Ph.D

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Bibliographic Details
Main Author:	XIE RUILONG
Other Authors:	ELECTRICAL & COMPUTER ENGINEERING
Format:	Theses and Dissertations
Language:	English
Published:	2010
Subjects:	semiconductor, germanium, MOS, transistor, high-k, passivation,
Online Access:	http://scholarbank.nus.edu.sg/handle/10635/18219
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Institution:	National University of Singapore
Language:	English

id	sg-nus-scholar.10635-18219
record_format	dspace
spelling	sg-nus-scholar.10635-182192015-01-13T05:38:31Z Development and characterization of high-k dielectric/germanium gate stack XIE RUILONG ELECTRICAL & COMPUTER ENGINEERING ZHU CHUNXIANG LI MING-FU YU MINGBIN semiconductor, germanium, MOS, transistor, high-k, passivation, Ph.D DOCTOR OF PHILOSOPHY 2010-09-30T18:00:31Z 2010-09-30T18:00:31Z 2009-12-07 Thesis XIE RUILONG (2009-12-07). Development and characterization of high-k dielectric/germanium gate stack. ScholarBank@NUS Repository. http://scholarbank.nus.edu.sg/handle/10635/18219 NOT_IN_WOS en
institution	National University of Singapore
building	NUS Library
country	Singapore
collection	ScholarBank@NUS
language	English
topic	semiconductor, germanium, MOS, transistor, high-k, passivation,
spellingShingle	semiconductor, germanium, MOS, transistor, high-k, passivation, XIE RUILONG Development and characterization of high-k dielectric/germanium gate stack
description	Ph.D
author2	ELECTRICAL & COMPUTER ENGINEERING
author_facet	ELECTRICAL & COMPUTER ENGINEERING XIE RUILONG
format	Theses and Dissertations
author	XIE RUILONG
author_sort	XIE RUILONG
title	Development and characterization of high-k dielectric/germanium gate stack
title_short	Development and characterization of high-k dielectric/germanium gate stack
title_full	Development and characterization of high-k dielectric/germanium gate stack
title_fullStr	Development and characterization of high-k dielectric/germanium gate stack
title_full_unstemmed	Development and characterization of high-k dielectric/germanium gate stack
title_sort	development and characterization of high-k dielectric/germanium gate stack
publishDate	2010
url	http://scholarbank.nus.edu.sg/handle/10635/18219
_version_	1681079543186587648

Development and characterization of high-k dielectric/germanium gate stack

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