Development and characterization of high-k dielectric/germanium gate stack

Ph.D

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Bibliographic Details
Main Author: XIE RUILONG
Other Authors: ELECTRICAL & COMPUTER ENGINEERING
Format: Theses and Dissertations
Language:English
Published: 2010
Subjects:
Online Access:http://scholarbank.nus.edu.sg/handle/10635/18219
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Institution: National University of Singapore
Language: English