Boosting contact sliding and wear protection via atomic intermixing and tailoring of nanoscale interfaces

• المؤلفون الرئيسيون: Dwivedi, N., Yeo, R.J., Dhand, C., Risan, J., Nay, R., Tripathy, S., Rajauria, S., Saifullah, M.S.M., Sankaranarayanan, S.K.R.S., Yang, H., Danner, A., Bhatia, C.S.
• مؤلفون آخرون: ELECTRICAL AND COMPUTER ENGINEERING
• التنسيق: مقال
• منشور في: American Association for the Advancement of Science 2021
• الوصول للمادة أونلاين: https://scholarbank.nus.edu.sg/handle/10635/210807

10.1126/sciadv.aau7886