Bottom-electrode induced defects in self-assembled monolayer (SAM)-based tunnel junctions affect only the SAM resistance, not the contact resistance or SAM capacitance

10.1039/c8ra01513a

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Main Authors: Sangeeth, C.S.S., Jiang, L., Nijhuis, C.A.
Other Authors: CHEMISTRY
Format: Article
Published: Royal Society of Chemistry 2021
Online Access:https://scholarbank.nus.edu.sg/handle/10635/210889
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spelling sg-nus-scholar.10635-2108892024-04-17T06:16:09Z Bottom-electrode induced defects in self-assembled monolayer (SAM)-based tunnel junctions affect only the SAM resistance, not the contact resistance or SAM capacitance Sangeeth, C.S.S. Jiang, L. Nijhuis, C.A. CHEMISTRY 10.1039/c8ra01513a RSC Advances 8 36 19939-19949 2021-12-16T07:56:39Z 2021-12-16T07:56:39Z 2018 Article Sangeeth, C.S.S., Jiang, L., Nijhuis, C.A. (2018). Bottom-electrode induced defects in self-assembled monolayer (SAM)-based tunnel junctions affect only the SAM resistance, not the contact resistance or SAM capacitance. RSC Advances 8 (36) : 19939-19949. ScholarBank@NUS Repository. https://doi.org/10.1039/c8ra01513a 20462069 https://scholarbank.nus.edu.sg/handle/10635/210889 Attribution-NonCommercial 4.0 International https://creativecommons.org/licenses/by-nc/4.0/ Royal Society of Chemistry Scopus OA2018
institution National University of Singapore
building NUS Library
continent Asia
country Singapore
Singapore
content_provider NUS Library
collection ScholarBank@NUS
description 10.1039/c8ra01513a
author2 CHEMISTRY
author_facet CHEMISTRY
Sangeeth, C.S.S.
Jiang, L.
Nijhuis, C.A.
format Article
author Sangeeth, C.S.S.
Jiang, L.
Nijhuis, C.A.
spellingShingle Sangeeth, C.S.S.
Jiang, L.
Nijhuis, C.A.
Bottom-electrode induced defects in self-assembled monolayer (SAM)-based tunnel junctions affect only the SAM resistance, not the contact resistance or SAM capacitance
author_sort Sangeeth, C.S.S.
title Bottom-electrode induced defects in self-assembled monolayer (SAM)-based tunnel junctions affect only the SAM resistance, not the contact resistance or SAM capacitance
title_short Bottom-electrode induced defects in self-assembled monolayer (SAM)-based tunnel junctions affect only the SAM resistance, not the contact resistance or SAM capacitance
title_full Bottom-electrode induced defects in self-assembled monolayer (SAM)-based tunnel junctions affect only the SAM resistance, not the contact resistance or SAM capacitance
title_fullStr Bottom-electrode induced defects in self-assembled monolayer (SAM)-based tunnel junctions affect only the SAM resistance, not the contact resistance or SAM capacitance
title_full_unstemmed Bottom-electrode induced defects in self-assembled monolayer (SAM)-based tunnel junctions affect only the SAM resistance, not the contact resistance or SAM capacitance
title_sort bottom-electrode induced defects in self-assembled monolayer (sam)-based tunnel junctions affect only the sam resistance, not the contact resistance or sam capacitance
publisher Royal Society of Chemistry
publishDate 2021
url https://scholarbank.nus.edu.sg/handle/10635/210889
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