Impact of Trap Profile on the Characteristics of 2-D MoS<sub>2</sub> Memtransistors: A Simulation Study

10.1109/TED.2022.3186867

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Main Authors: Zhang, Panpan, Feng, Xuewei, Fong, Xuanyao
Other Authors: ELECTRICAL AND COMPUTER ENGINEERING
Format: Article
Language:English
Published: IEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC 2023
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Online Access:https://scholarbank.nus.edu.sg/handle/10635/245754
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Institution: National University of Singapore
Language: English
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spelling sg-nus-scholar.10635-2457542024-04-16T11:53:27Z Impact of Trap Profile on the Characteristics of 2-D MoS<sub>2</sub> Memtransistors: A Simulation Study Zhang, Panpan Feng, Xuewei Fong, Xuanyao ELECTRICAL AND COMPUTER ENGINEERING Science & Technology Technology Physical Sciences Engineering, Electrical & Electronic Physics, Applied Engineering Physics Memtransistor molybdenum disulfide (MoS2) Schottky barrier (SB) technology computer-aided design (TCAD) trap CONTACT RESISTANCE METAL TRANSITION 10.1109/TED.2022.3186867 IEEE TRANSACTIONS ON ELECTRON DEVICES 69 8 4750-4756 2023-11-06T07:14:23Z 2023-11-06T07:14:23Z 2022-08 2023-11-05T08:55:34Z Article Zhang, Panpan, Feng, Xuewei, Fong, Xuanyao (2022-08). Impact of Trap Profile on the Characteristics of 2-D MoS<sub>2</sub> Memtransistors: A Simulation Study. IEEE TRANSACTIONS ON ELECTRON DEVICES 69 (8) : 4750-4756. ScholarBank@NUS Repository. https://doi.org/10.1109/TED.2022.3186867 0018-9383 1557-9646 https://scholarbank.nus.edu.sg/handle/10635/245754 en IEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC Elements
institution National University of Singapore
building NUS Library
continent Asia
country Singapore
Singapore
content_provider NUS Library
collection ScholarBank@NUS
language English
topic Science & Technology
Technology
Physical Sciences
Engineering, Electrical & Electronic
Physics, Applied
Engineering
Physics
Memtransistor
molybdenum disulfide (MoS2)
Schottky barrier (SB)
technology computer-aided design (TCAD)
trap
CONTACT RESISTANCE
METAL
TRANSITION
spellingShingle Science & Technology
Technology
Physical Sciences
Engineering, Electrical & Electronic
Physics, Applied
Engineering
Physics
Memtransistor
molybdenum disulfide (MoS2)
Schottky barrier (SB)
technology computer-aided design (TCAD)
trap
CONTACT RESISTANCE
METAL
TRANSITION
Zhang, Panpan
Feng, Xuewei
Fong, Xuanyao
Impact of Trap Profile on the Characteristics of 2-D MoS<sub>2</sub> Memtransistors: A Simulation Study
description 10.1109/TED.2022.3186867
author2 ELECTRICAL AND COMPUTER ENGINEERING
author_facet ELECTRICAL AND COMPUTER ENGINEERING
Zhang, Panpan
Feng, Xuewei
Fong, Xuanyao
format Article
author Zhang, Panpan
Feng, Xuewei
Fong, Xuanyao
author_sort Zhang, Panpan
title Impact of Trap Profile on the Characteristics of 2-D MoS<sub>2</sub> Memtransistors: A Simulation Study
title_short Impact of Trap Profile on the Characteristics of 2-D MoS<sub>2</sub> Memtransistors: A Simulation Study
title_full Impact of Trap Profile on the Characteristics of 2-D MoS<sub>2</sub> Memtransistors: A Simulation Study
title_fullStr Impact of Trap Profile on the Characteristics of 2-D MoS<sub>2</sub> Memtransistors: A Simulation Study
title_full_unstemmed Impact of Trap Profile on the Characteristics of 2-D MoS<sub>2</sub> Memtransistors: A Simulation Study
title_sort impact of trap profile on the characteristics of 2-d mos<sub>2</sub> memtransistors: a simulation study
publisher IEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC
publishDate 2023
url https://scholarbank.nus.edu.sg/handle/10635/245754
_version_ 1800915966451777536