Growth and characterization of UHV sputtering HfO2film by plasma oxidation and low temperature annealing

• Main Authors: Li, Q., Ong, C.K., Wang, S.J., Wang, W.D., Chi, D.Z., Huan, A.C.H.
• 其他作者: PHYSICS
• 格式: Conference or Workshop Item
• 出版: 2011
• 主題: High-k dielectric thin films; Metal-oxide-semiconductor; Rapid thermal annealing; UHV sputtering
• 在線閱讀: http://scholarbank.nus.edu.sg/handle/10635/28959
• 機構: National University of Singapore

10.1007/s10832-006-9909-x