High-thermal-stability (HfO2)1-x(Al2O3)xfilm fabricated by dual-beam laser ablation

• Main Authors: Li, Q., Ong, C.K., Wang, S.J., Huan, A.C.H., Ng, T.H., Chim, W.K.
• Other Authors: SINGAPORE-MIT ALLIANCE
• Format: Conference or Workshop Item
• Published: 2011
• Subjects: High-k dielectric thin films; Interface; Metal-insulator-semiconductor structures; Pulse laser deposition
• Online Access: http://scholarbank.nus.edu.sg/handle/10635/28960
• Institution: National University of Singapore

Thin Solid Films