Method to fabricate a large planar area ONO interpoly dielectric in flash device

US6051467

Saved in:

Bibliographic Details
Main Authors:	CHAN, LAP, CHA, CHER LIANG
Other Authors:	ELECTRICAL ENGINEERING
Format:	Patent
Published:	2012
Online Access:	http://scholarbank.nus.edu.sg/handle/10635/32574
Tags:	Add Tag No Tags, Be the first to tag this record!
Institution:	National University of Singapore

id	sg-nus-scholar.10635-32574
record_format	dspace
spelling	sg-nus-scholar.10635-325742015-07-29T07:03:41Z Method to fabricate a large planar area ONO interpoly dielectric in flash device CHAN, LAP CHA, CHER LIANG ELECTRICAL ENGINEERING CHARTERED SEMICONDUCTOR MANUFACTURING, LTD. () NATIONAL UNIVERSITY OF SINGAPORE US6051467 Granted Patent 2012-05-02T02:27:14Z 2012-05-02T02:27:14Z 2000-04-18 Patent CHAN, LAP,CHA, CHER LIANG (2000-04-18). Method to fabricate a large planar area ONO interpoly dielectric in flash device. ScholarBank@NUS Repository. http://scholarbank.nus.edu.sg/handle/10635/32574 NOT_IN_WOS PatSnap
institution	National University of Singapore
building	NUS Library
country	Singapore
collection	ScholarBank@NUS
description	US6051467
author2	ELECTRICAL ENGINEERING
author_facet	ELECTRICAL ENGINEERING CHAN, LAP CHA, CHER LIANG
format	Patent
author	CHAN, LAP CHA, CHER LIANG
spellingShingle	CHAN, LAP CHA, CHER LIANG Method to fabricate a large planar area ONO interpoly dielectric in flash device
author_sort	CHAN, LAP
title	Method to fabricate a large planar area ONO interpoly dielectric in flash device
title_short	Method to fabricate a large planar area ONO interpoly dielectric in flash device
title_full	Method to fabricate a large planar area ONO interpoly dielectric in flash device
title_fullStr	Method to fabricate a large planar area ONO interpoly dielectric in flash device
title_full_unstemmed	Method to fabricate a large planar area ONO interpoly dielectric in flash device
title_sort	method to fabricate a large planar area ono interpoly dielectric in flash device
publishDate	2012
url	http://scholarbank.nus.edu.sg/handle/10635/32574
_version_	1681081248310624256

Method to fabricate a large planar area ONO interpoly dielectric in flash device

Similar Items