Method to form narrow and wide shallow trench isolations with different trench depths to eliminate isolation oxide dishing

US6207534

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Bibliographic Details
Main Authors: CHAN, LAP, CHA, CHER LIANG, LEE, TECK KOON
Other Authors: ELECTRICAL & COMPUTER ENGINEERING
Format: Patent
Published: 2012
Online Access:http://scholarbank.nus.edu.sg/handle/10635/32588
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Institution: National University of Singapore
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Summary:US6207534