Method to form narrow and wide shallow trench isolations with different trench depths to eliminate isolation oxide dishing

Method to form narrow and wide shallow trench isolations with different trench depths to eliminate isolation oxide dishing

US6207534

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Main Authors: CHAN, LAP, CHA, CHER LIANG, LEE, TECK KOON
Other Authors: ELECTRICAL & COMPUTER ENGINEERING
Format: Patent
Published: 2012
Online Access:http://scholarbank.nus.edu.sg/handle/10635/32588
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Institution: National University of Singapore
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spelling sg-nus-scholar.10635-325882015-07-29T07:03:42Z Method to form narrow and wide shallow trench isolations with different trench depths to eliminate isolation oxide dishing CHAN, LAP CHA, CHER LIANG LEE, TECK KOON ELECTRICAL & COMPUTER ENGINEERING CHARTERED SEMICONDUCTOR MANUFACTURING LTD. (SINGAPORE, SG) NATIONAL UNIVERSITY OF SINGAPORE US6207534 Granted Patent 2012-05-02T02:27:26Z 2012-05-02T02:27:26Z 2001-03-27 Patent CHAN, LAP,CHA, CHER LIANG,LEE, TECK KOON (2001-03-27). Method to form narrow and wide shallow trench isolations with different trench depths to eliminate isolation oxide dishing. ScholarBank@NUS Repository. http://scholarbank.nus.edu.sg/handle/10635/32588 NOT_IN_WOS PatSnap
institution National University of Singapore
building NUS Library
country Singapore
collection ScholarBank@NUS
description US6207534
author2 ELECTRICAL & COMPUTER ENGINEERING
author_facet ELECTRICAL & COMPUTER ENGINEERING
CHAN, LAP
CHA, CHER LIANG
LEE, TECK KOON
format Patent
author CHAN, LAP
CHA, CHER LIANG
LEE, TECK KOON
spellingShingle CHAN, LAP
CHA, CHER LIANG
LEE, TECK KOON
Method to form narrow and wide shallow trench isolations with different trench depths to eliminate isolation oxide dishing
author_sort CHAN, LAP
title Method to form narrow and wide shallow trench isolations with different trench depths to eliminate isolation oxide dishing
title_short Method to form narrow and wide shallow trench isolations with different trench depths to eliminate isolation oxide dishing
title_full Method to form narrow and wide shallow trench isolations with different trench depths to eliminate isolation oxide dishing
title_fullStr Method to form narrow and wide shallow trench isolations with different trench depths to eliminate isolation oxide dishing
title_full_unstemmed Method to form narrow and wide shallow trench isolations with different trench depths to eliminate isolation oxide dishing
title_sort method to form narrow and wide shallow trench isolations with different trench depths to eliminate isolation oxide dishing
publishDate 2012
url http://scholarbank.nus.edu.sg/handle/10635/32588
_version_ 1681081250837692416

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