Simplified dual damascene process utilizing PPMSO as an insulator layer
US6323125
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2012
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sg-nus-scholar.10635-326032015-07-29T07:03:43Z Simplified dual damascene process utilizing PPMSO as an insulator layer SOO, CHOI PHENG LOH, WYE BOON CHAN, LAP MATERIALS SCIENCE CHARTERED SEMICONDUCTOR MANUFACTURING LTD (SINGAPORE, SG) NATIONAL UNIVERSITY OF SINGAPORE (SINGAPORE, SG) NAHYANG TECHNOLOGICAL UNIVERSITY OF SINGAPORE US6323125 Granted Patent 2012-05-02T02:27:39Z 2012-05-02T02:27:39Z 2001-11-27 Patent SOO, CHOI PHENG,LOH, WYE BOON,CHAN, LAP (2001-11-27). Simplified dual damascene process utilizing PPMSO as an insulator layer. ScholarBank@NUS Repository. http://scholarbank.nus.edu.sg/handle/10635/32603 NOT_IN_WOS PatSnap |
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US6323125 |
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MATERIALS SCIENCE |
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MATERIALS SCIENCE SOO, CHOI PHENG LOH, WYE BOON CHAN, LAP |
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SOO, CHOI PHENG LOH, WYE BOON CHAN, LAP |
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SOO, CHOI PHENG LOH, WYE BOON CHAN, LAP Simplified dual damascene process utilizing PPMSO as an insulator layer |
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SOO, CHOI PHENG |
title |
Simplified dual damascene process utilizing PPMSO as an insulator layer |
title_short |
Simplified dual damascene process utilizing PPMSO as an insulator layer |
title_full |
Simplified dual damascene process utilizing PPMSO as an insulator layer |
title_fullStr |
Simplified dual damascene process utilizing PPMSO as an insulator layer |
title_full_unstemmed |
Simplified dual damascene process utilizing PPMSO as an insulator layer |
title_sort |
simplified dual damascene process utilizing ppmso as an insulator layer |
publishDate |
2012 |
url |
http://scholarbank.nus.edu.sg/handle/10635/32603 |
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1681081253579718656 |