Simplified dual damascene process utilizing PPMSO as an insulator layer

US6323125

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Main Authors: SOO, CHOI PHENG, LOH, WYE BOON, CHAN, LAP
Other Authors: MATERIALS SCIENCE
Format: Patent
Published: 2012
Online Access:http://scholarbank.nus.edu.sg/handle/10635/32603
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Institution: National University of Singapore
id sg-nus-scholar.10635-32603
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spelling sg-nus-scholar.10635-326032015-07-29T07:03:43Z Simplified dual damascene process utilizing PPMSO as an insulator layer SOO, CHOI PHENG LOH, WYE BOON CHAN, LAP MATERIALS SCIENCE CHARTERED SEMICONDUCTOR MANUFACTURING LTD (SINGAPORE, SG) NATIONAL UNIVERSITY OF SINGAPORE (SINGAPORE, SG) NAHYANG TECHNOLOGICAL UNIVERSITY OF SINGAPORE US6323125 Granted Patent 2012-05-02T02:27:39Z 2012-05-02T02:27:39Z 2001-11-27 Patent SOO, CHOI PHENG,LOH, WYE BOON,CHAN, LAP (2001-11-27). Simplified dual damascene process utilizing PPMSO as an insulator layer. ScholarBank@NUS Repository. http://scholarbank.nus.edu.sg/handle/10635/32603 NOT_IN_WOS PatSnap
institution National University of Singapore
building NUS Library
country Singapore
collection ScholarBank@NUS
description US6323125
author2 MATERIALS SCIENCE
author_facet MATERIALS SCIENCE
SOO, CHOI PHENG
LOH, WYE BOON
CHAN, LAP
format Patent
author SOO, CHOI PHENG
LOH, WYE BOON
CHAN, LAP
spellingShingle SOO, CHOI PHENG
LOH, WYE BOON
CHAN, LAP
Simplified dual damascene process utilizing PPMSO as an insulator layer
author_sort SOO, CHOI PHENG
title Simplified dual damascene process utilizing PPMSO as an insulator layer
title_short Simplified dual damascene process utilizing PPMSO as an insulator layer
title_full Simplified dual damascene process utilizing PPMSO as an insulator layer
title_fullStr Simplified dual damascene process utilizing PPMSO as an insulator layer
title_full_unstemmed Simplified dual damascene process utilizing PPMSO as an insulator layer
title_sort simplified dual damascene process utilizing ppmso as an insulator layer
publishDate 2012
url http://scholarbank.nus.edu.sg/handle/10635/32603
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