Method of fabricating a CMOS device with dual metal gate electrodes

US7316950

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Bibliographic Details
Main Authors:	PARK, CHANG SEO, CHO, BYUNG JIN, BALASUBRAMANIAN, NARAYANAN T.
Other Authors:	ELECTRICAL & COMPUTER ENGINEERING
Format:	Patent
Published:	2012
Online Access:	http://scholarbank.nus.edu.sg/handle/10635/32753
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Institution:	National University of Singapore

id	sg-nus-scholar.10635-32753
record_format	dspace
spelling	sg-nus-scholar.10635-327532024-11-14T01:25:08Z Method of fabricating a CMOS device with dual metal gate electrodes PARK, CHANG SEO CHO, BYUNG JIN BALASUBRAMANIAN, NARAYANAN T. ELECTRICAL & COMPUTER ENGINEERING NATIONAL UNIVERSITY OF SINGAPORE US7316950 Granted Patent 2012-05-02T02:29:53Z 2012-05-02T02:29:53Z 2008-01-08 Patent PARK, CHANG SEO,CHO, BYUNG JIN,BALASUBRAMANIAN, NARAYANAN T. (2008-01-08). Method of fabricating a CMOS device with dual metal gate electrodes. ScholarBank@NUS Repository. http://scholarbank.nus.edu.sg/handle/10635/32753 NOT_IN_WOS PatSnap
institution	National University of Singapore
building	NUS Library
continent	Asia
country	Singapore Singapore
content_provider	NUS Library
collection	ScholarBank@NUS
description	US7316950
author2	ELECTRICAL & COMPUTER ENGINEERING
author_facet	ELECTRICAL & COMPUTER ENGINEERING PARK, CHANG SEO CHO, BYUNG JIN BALASUBRAMANIAN, NARAYANAN T.
format	Patent
author	PARK, CHANG SEO CHO, BYUNG JIN BALASUBRAMANIAN, NARAYANAN T.
spellingShingle	PARK, CHANG SEO CHO, BYUNG JIN BALASUBRAMANIAN, NARAYANAN T. Method of fabricating a CMOS device with dual metal gate electrodes
author_sort	PARK, CHANG SEO
title	Method of fabricating a CMOS device with dual metal gate electrodes
title_short	Method of fabricating a CMOS device with dual metal gate electrodes
title_full	Method of fabricating a CMOS device with dual metal gate electrodes
title_fullStr	Method of fabricating a CMOS device with dual metal gate electrodes
title_full_unstemmed	Method of fabricating a CMOS device with dual metal gate electrodes
title_sort	method of fabricating a cmos device with dual metal gate electrodes
publishDate	2012
url	http://scholarbank.nus.edu.sg/handle/10635/32753
_version_	1821233783200808960

Method of fabricating a CMOS device with dual metal gate electrodes

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