Positive Photoresist as a Sacrificial Layer for MEMS Micro-component Fabrication with SU-8 Polymer

Master's

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Main Author: LAU KIA HIAN
Other Authors: MECHANICAL ENGINEERING
Format: Theses and Dissertations
Language:English
Published: 2013
Subjects:
Online Access:http://scholarbank.nus.edu.sg/handle/10635/36364
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Institution: National University of Singapore
Language: English
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spelling sg-nus-scholar.10635-363642024-10-25T12:06:31Z Positive Photoresist as a Sacrificial Layer for MEMS Micro-component Fabrication with SU-8 Polymer LAU KIA HIAN MECHANICAL ENGINEERING SINHA, SUJEET KUMAR SU-8, Sacrificial layer, MEMS, Microfabrication, Positive photoresist, metallization layer, polymer, lift-off process, surface energy Master's MASTER OF ENGINEERING 2013-02-28T18:02:04Z 2013-02-28T18:02:04Z 2012-08-13 Thesis LAU KIA HIAN (2012-08-13). Positive Photoresist as a Sacrificial Layer for MEMS Micro-component Fabrication with SU-8 Polymer. ScholarBank@NUS Repository. http://scholarbank.nus.edu.sg/handle/10635/36364 NOT_IN_WOS en
institution National University of Singapore
building NUS Library
continent Asia
country Singapore
Singapore
content_provider NUS Library
collection ScholarBank@NUS
language English
topic SU-8, Sacrificial layer, MEMS, Microfabrication, Positive photoresist, metallization layer, polymer, lift-off process, surface energy
spellingShingle SU-8, Sacrificial layer, MEMS, Microfabrication, Positive photoresist, metallization layer, polymer, lift-off process, surface energy
LAU KIA HIAN
Positive Photoresist as a Sacrificial Layer for MEMS Micro-component Fabrication with SU-8 Polymer
description Master's
author2 MECHANICAL ENGINEERING
author_facet MECHANICAL ENGINEERING
LAU KIA HIAN
format Theses and Dissertations
author LAU KIA HIAN
author_sort LAU KIA HIAN
title Positive Photoresist as a Sacrificial Layer for MEMS Micro-component Fabrication with SU-8 Polymer
title_short Positive Photoresist as a Sacrificial Layer for MEMS Micro-component Fabrication with SU-8 Polymer
title_full Positive Photoresist as a Sacrificial Layer for MEMS Micro-component Fabrication with SU-8 Polymer
title_fullStr Positive Photoresist as a Sacrificial Layer for MEMS Micro-component Fabrication with SU-8 Polymer
title_full_unstemmed Positive Photoresist as a Sacrificial Layer for MEMS Micro-component Fabrication with SU-8 Polymer
title_sort positive photoresist as a sacrificial layer for mems micro-component fabrication with su-8 polymer
publishDate 2013
url http://scholarbank.nus.edu.sg/handle/10635/36364
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