Methods for enhancing photolithography patterning

• Main Authors: LING, MOH LUNG, CHUA, GEK SOON, LIN, QUNYING, TAY, CHO JUI, QUAN, CHENGGEN
• Other Authors: MECHANICAL ENGINEERING
• Format: Patent
• Published: 2013
• Online Access: http://scholarbank.nus.edu.sg/handle/10635/43443
• Institution: National University of Singapore

US8450046