Design for Manufacturing in IC Fabrication: Mask Cost, Circuit Performance and Convergence

Ph.D

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Bibliographic Details
Main Author:	QU YIFAN
Other Authors:	NUS GRAD SCH FOR INTEGRATIVE SCI & ENGG
Format:	Theses and Dissertations
Language:	English
Published:	2013
Subjects:	Semiconductor manufacturing, lithography, circuit performance, mask cost, feedback control, design for manufacturing
Online Access:	http://scholarbank.nus.edu.sg/handle/10635/48614
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Institution:	National University of Singapore
Language:	English

id	sg-nus-scholar.10635-48614
record_format	dspace
spelling	sg-nus-scholar.10635-486142015-01-23T21:00:04Z Design for Manufacturing in IC Fabrication: Mask Cost, Circuit Performance and Convergence QU YIFAN NUS GRAD SCH FOR INTEGRATIVE SCI & ENGG LEE TONG HENG TAY EE BENG, ARTHUR GAN OON PEEN Semiconductor manufacturing, lithography, circuit performance, mask cost, feedback control, design for manufacturing Ph.D DOCTOR OF PHILOSOPHY 2013-12-31T18:05:48Z 2013-12-31T18:05:48Z 2013-07-12 Thesis QU YIFAN (2013-07-12). Design for Manufacturing in IC Fabrication: Mask Cost, Circuit Performance and Convergence. ScholarBank@NUS Repository. http://scholarbank.nus.edu.sg/handle/10635/48614 NOT_IN_WOS en
institution	National University of Singapore
building	NUS Library
country	Singapore
collection	ScholarBank@NUS
language	English
topic	Semiconductor manufacturing, lithography, circuit performance, mask cost, feedback control, design for manufacturing
spellingShingle	Semiconductor manufacturing, lithography, circuit performance, mask cost, feedback control, design for manufacturing QU YIFAN Design for Manufacturing in IC Fabrication: Mask Cost, Circuit Performance and Convergence
description	Ph.D
author2	NUS GRAD SCH FOR INTEGRATIVE SCI & ENGG
author_facet	NUS GRAD SCH FOR INTEGRATIVE SCI & ENGG QU YIFAN
format	Theses and Dissertations
author	QU YIFAN
author_sort	QU YIFAN
title	Design for Manufacturing in IC Fabrication: Mask Cost, Circuit Performance and Convergence
title_short	Design for Manufacturing in IC Fabrication: Mask Cost, Circuit Performance and Convergence
title_full	Design for Manufacturing in IC Fabrication: Mask Cost, Circuit Performance and Convergence
title_fullStr	Design for Manufacturing in IC Fabrication: Mask Cost, Circuit Performance and Convergence
title_full_unstemmed	Design for Manufacturing in IC Fabrication: Mask Cost, Circuit Performance and Convergence
title_sort	design for manufacturing in ic fabrication: mask cost, circuit performance and convergence
publishDate	2013
url	http://scholarbank.nus.edu.sg/handle/10635/48614
_version_	1681083502355808256

Design for Manufacturing in IC Fabrication: Mask Cost, Circuit Performance and Convergence

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